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Abstract:
以单相多晶Cu_(1+x)Al_(1-x)O_2陶瓷做靶材,采用射频磁控溅射方法在石英衬底上沉积了Cu过量的Cu_(1+x)Al_(1-x)O_2(0≤x≤0. 04)薄膜。通过X射线衍射(XRD)、紫外吸收光谱以及电导率的测试,表征了不同含Cu量Cu_(1+x)Al_(1-x)O_2薄膜的结构与光电性能。结果表明,沉积态薄膜经退火处理后,由非晶转变为具有铜铁矿结构的纯相Cu_(1+x)Al_(1-x)O_2;退火态薄膜在可见光区域的平均透过率约为55%,平均可见光透过率不受Cu含量的影响;退火态薄膜样品的室温电导率随Cu含量的增加而增大,Cu_(1.04)Al_(0.96)O_2的室温电导率...
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Source :
人工晶体学报
Year: 2019
Issue: 04
Volume: 48
Page: 633-640
Cited Count:
WoS CC Cited Count: 0
SCOPUS Cited Count:
ESI Highly Cited Papers on the List: 0 Unfold All
WanFang Cited Count:
Chinese Cited Count:
30 Days PV: 8
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