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Author:

Ke, Xiaoxing (Ke, Xiaoxing.) | Bittencourt, Carla (Bittencourt, Carla.) | Van Tendeloo, Gustaaf (Van Tendeloo, Gustaaf.)

Indexed by:

EI Scopus SCIE PubMed

Abstract:

A major revolution for electron microscopy in the past decade is the introduction of aberration correction, which enables one to increase both the spatial resolution and the energy resolution to the optical limit. Aberration correction has contributed significantly to the imaging at low operating voltages. This is crucial for carbon-based nanomaterials which are sensitive to electron irradiation. The research of carbon nanomaterials and nanohybrids, in particular the fundamental understanding of defects and interfaces, can now be carried out in unprecedented detail by aberration-corrected transmission electron microscopy (AC-TEM). This review discusses new possibilities and limits of AC-TEM at low voltage, including the structural imaging at atomic resolution, in three dimensions and spectroscopic investigation of chemistry and bonding. In situ TEM of carbon-based nanomaterials is discussed and illustrated through recent reports with particular emphasis on the underlying physics of interactions between electrons and carbon atoms.

Keyword:

low-kV imaging carbon TEM nanostructures aberration-corrected

Author Community:

  • [ 1 ] [Ke, Xiaoxing]Univ Antwerp, EMAT, B-2020 Antwerp, Belgium
  • [ 2 ] [Van Tendeloo, Gustaaf]Univ Antwerp, EMAT, B-2020 Antwerp, Belgium
  • [ 3 ] [Ke, Xiaoxing]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
  • [ 4 ] [Bittencourt, Carla]Univ Mons, Chem Interact Plasma Surface ChiPS, B-7000 Mons, Belgium

Reprint Author's Address:

  • [Ke, Xiaoxing]Univ Antwerp, EMAT, Groenenborgerlaan 171, B-2020 Antwerp, Belgium

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Source :

BEILSTEIN JOURNAL OF NANOTECHNOLOGY

ISSN: 2190-4286

Year: 2015

Volume: 6

Page: 1541-1557

3 . 1 0 0

JCR@2022

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:319

JCR Journal Grade:1

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count: 23

SCOPUS Cited Count: 28

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 4

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