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Author:

Li, Xiong (Li, Xiong.) | Xu, Denghui (Xu, Denghui.) | Che, Xinglai (Che, Xinglai.) | Geng, Aicong (Geng, Aicong.) | Zhao, Jia (Zhao, Jia.) | Chen, Xiaobai (Chen, Xiaobai.) | Jiang, Zhuqing (Jiang, Zhuqing.) (Scholars:江竹青)

Indexed by:

Scopus SCIE

Abstract:

Based on two-center model, multiplexing of nonvolatile holograms with equal-time exposure in LiNbO3:Fe:Cu crystals was simulated by using Runge-Kutta method, and the physical mechanism of equal-time multiplexing was analyzed. Considering both the mechanisms of optical erasure and varied diffraction efficiency, equal exposure time can compensate for the gradual decrease of sensitivity when recording latter-recorded holograms and holograms with nearly equal diffraction efficiencies can be achieved. The optimization of multiplexing holograms with higher diffraction efficiency was discussed, when intensity ratio of red beams to UV beam I-R/I-UV is about 15, the maximum of the average diffraction efficiency can be obtained. (C) 2015 Elsevier GmbH. All rights reserved.

Keyword:

Holography Diffraction efficiency Lithium niobate crystals Multiplexing

Author Community:

  • [ 1 ] [Li, Xiong]Beijing Technol & Business Univ, Dept Phys, Beijing 100048, Peoples R China
  • [ 2 ] [Xu, Denghui]Beijing Technol & Business Univ, Dept Phys, Beijing 100048, Peoples R China
  • [ 3 ] [Che, Xinglai]Beijing Technol & Business Univ, Dept Phys, Beijing 100048, Peoples R China
  • [ 4 ] [Geng, Aicong]Beijing Technol & Business Univ, Dept Phys, Beijing 100048, Peoples R China
  • [ 5 ] [Zhao, Jia]Beijing Technol & Business Univ, Dept Phys, Beijing 100048, Peoples R China
  • [ 6 ] [Chen, Xiaobai]Beijing Technol & Business Univ, Dept Phys, Beijing 100048, Peoples R China
  • [ 7 ] [Jiang, Zhuqing]Beijing Univ Technol, Coll Appl Sci, Beijing 100124, Peoples R China

Reprint Author's Address:

  • [Li, Xiong]Beijing Technol & Business Univ, Dept Phys, Beijing 100048, Peoples R China

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Source :

OPTIK

ISSN: 0030-4026

Year: 2015

Issue: 23

Volume: 126

Page: 4228-4231

3 . 1 0 0

JCR@2022

ESI Discipline: PHYSICS;

ESI HC Threshold:190

JCR Journal Grade:4

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 5

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