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Abstract:
介绍了稀土钼金属陶瓷阴极、钪钨基扩散阴极及化学气相沉积法制备钨涂层.为了满足大功率磁控管的发展要求,研究了新型稀土钼金属陶瓷阴极.经过高温激活处理后,材料的最大次级发射系数达5.24,实用管型测试结果表明,稀土钼金属陶瓷阴极的性能优于钡钨阴极,显示了良好的应用前景.亚微米结构的钪钨基扩散阴极具有优异的热发射性能,850℃下阴极的发射电流密度可达42A/cm2,激活后Ba,Sc,O等元素形成的活性多层,均匀覆盖在阴极表面,促进了阴极的发射.采用热壁开管气流CVD法,以WF6和H2为反应源气体,可以方便地制备成难熔金属钨沉积层.所获得钨沉积层具有高纯度(>99%)和高致密度(>19 g/cm3).
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中国钨业
ISSN: 1009-0622
Year: 2009
Issue: 5
Volume: 24
Page: 116-120,124
Cited Count:
WoS CC Cited Count: 0
SCOPUS Cited Count:
ESI Highly Cited Papers on the List: 0 Unfold All
WanFang Cited Count: 1
Chinese Cited Count:
30 Days PV: 8
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