Indexed by:
Abstract:
采用电子背散射衍射(EBSD)技术,以30~40nm的空间分辨率,显示GaAs-AlGaAs外延结构中的应力分布.将菊池花样质量IQ和Hough峰,以及晶格错配和局部转动等测量参数作为应力敏感参数,分析GaAs-AlGaAs周期外延层中的应变状态.通过对菊池花样进行快速傅立叶变换和强度计算识别微区应变区域.
Keyword:
Reprint Author's Address:
Email:
Source :
功能材料
ISSN: 1001-9731
Year: 2008
Issue: 3
Volume: 39
Page: 515-518,522
Cited Count:
WoS CC Cited Count: 0
SCOPUS Cited Count:
ESI Highly Cited Papers on the List: 0 Unfold All
WanFang Cited Count: 5
Chinese Cited Count:
30 Days PV: 7
Affiliated Colleges: