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Author:

Croitoru, M. D. (Croitoru, M. D..) | Van Dyck, D. (Van Dyck, D..) | Liu, Y. Z. (Liu, Y. Z..) | Zhang, Z. (Zhang, Z..)

Indexed by:

EI Scopus SCIE

Abstract:

A non-destructive method for measuring the thickness of thin amorphous films composed of light elements has been developed. The method employs the statistics of the phase of the electron exit wave function. The accuracy of this method has been checked numerically by the multislice method and compared with that based on the mean inner potential. (C) 2008 Elsevier B.V. All rights reserved.

Keyword:

Thickness measurement Multislice simulation Amorphous materials

Author Community:

  • [ 1 ] [Croitoru, M. D.]Univ Antwerp, EMAT, B-2020 Antwerp, Belgium
  • [ 2 ] [Van Dyck, D.]Univ Antwerp, EMAT, B-2020 Antwerp, Belgium
  • [ 3 ] [Liu, Y. Z.]Chinese Acad Sci, Inst Phys, Beijing 100080, Peoples R China
  • [ 4 ] [Zhang, Z.]Beijing Univ Technol, Beijing, Peoples R China

Reprint Author's Address:

  • [Croitoru, M. D.]Univ Antwerp, EMAT, Groenenborgerlaan 171, B-2020 Antwerp, Belgium

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Source :

ULTRAMICROSCOPY

ISSN: 0304-3991

Year: 2008

Issue: 12

Volume: 108

Page: 1616-1622

2 . 2 0 0

JCR@2022

ESI Discipline: CHEMISTRY;

JCR Journal Grade:1

Cited Count:

WoS CC Cited Count: 4

SCOPUS Cited Count: 4

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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