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Author:

Wang, M. (Wang, M..) (Scholars:王民) | Huang, A. P. (Huang, A. P..) | Chu, Paul K. (Chu, Paul K..) | Wang, B. (Wang, B..) (Scholars:王波) | Yan, H. (Yan, H..)

Indexed by:

CPCI-S EI Scopus SCIE

Abstract:

The effects of plasma hydrogenation on the fabrication of nanocrystalline cubic silicon carbide (SiC) thin films on Si (100) are investigated. Our results indicate that plasma hydrogenation is an effective method to reduce the deposition temperature and to improve the composition and microstructure of the cubic SiC (beta-SiC) thin films. In particular, the crystal particle size and the oxygen diffusion can be controlled. The mechanism is discussed. (C) 2006 Elsevier B.V. All rights reserved.

Keyword:

plasma hydrogenation SiC PECVD film

Author Community:

  • [ 1 ] City Univ Hong Kong, Dept Phys & Mat Sci, Kowloon, Hong Kong, Peoples R China
  • [ 2 ] Beijing Univ Technol, Lab Thin Film Mat, Coll Mat Sci & Engn, Beijing 100022, Peoples R China
  • [ 3 ] Beihang Univ, Dept Phys, Beijing 100083, Peoples R China

Reprint Author's Address:

  • [Chu, Paul K.]City Univ Hong Kong, Dept Phys & Mat Sci, Tat Chee Ave, Kowloon, Hong Kong, Peoples R China

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Source :

DIAMOND AND RELATED MATERIALS

ISSN: 0925-9635

Year: 2007

Issue: 4-7

Volume: 16

Page: 826-830

4 . 1 0 0

JCR@2022

ESI Discipline: MATERIALS SCIENCE;

JCR Journal Grade:1

Cited Count:

WoS CC Cited Count: 4

SCOPUS Cited Count: 5

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 6

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