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Author:

王德志 (王德志.) | 刘心宇 (刘心宇.) | 左铁镛 (左铁镛.) (Scholars:左铁镛)

Indexed by:

CQVIP PKU CSCD

Abstract:

对La2O3添加剂增韧MoSi2材料的低温氧化(400~600 ℃)行为进行了研究.结果表明,材料低温氧化时,由于晶界面积增加和La2O3的加入,轻微降低了MoSi2的抗氧化性,但表面仍形成了致密的SiO2保护膜,阻碍了低温氧化的进一步进行,使材料未发生"PEST"现象.

Keyword:

材料 低温氧化 添加剂

Author Community:

  • [ 1 ] [王德志]中南大学
  • [ 2 ] [刘心宇]桂林电子科技大学
  • [ 3 ] [左铁镛]北京工业大学

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Source :

材料保护

ISSN: 1001-1560

Year: 2003

Issue: 5

Volume: 36

Page: 17-19

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count: 2

Chinese Cited Count:

30 Days PV: 5

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