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Author:

Wang, BB (Wang, BB.) | Lee, S (Lee, S.) | Xu, XZ (Xu, XZ.) | Choi, SH (Choi, SH.) | Yan, H (Yan, H.) | Zhang, B (Zhang, B.) | Hao, W (Hao, W.)

Indexed by:

EI Scopus SCIE

Abstract:

Carbon nanotubes were prepared on silicon wafers deposited with NiFe catalyst films and Ta buffer films by plasma-enhanced hot filament chemical vapor deposition, and growth of the carbon nanotubes under different pressure were investigated by scanning electron microscopy. It is found that the average length of the carbon nanotubes grown at the pressure of 15 Torr is larger than that at the pressure of 30 Torr. But, it is difficult to grow the carbon nanotubes when the pressure is 5 Torr. These indicate that the pressure greatly influences on the growth of carbon nanotubes. Combined with theories related to thermodynamics of alloy and glow discharge, it is analyzed and discussed that the pressure affects the growth of the carbon nanotubes. (C) 2004 Elsevier B.V. All rights reserved.

Keyword:

carbon nanotubes glow discharge chemical vapor deposition

Author Community:

  • [ 1 ] Beijing Univ Technol, Coll Appl Math & Phys, Beijing 100022, Peoples R China
  • [ 2 ] Ajou Univ, Dept Mol Sci & Technol, Suwon 442749, South Korea
  • [ 3 ] Chongqing Univ, Coll Mat Sci & Engn, Chongqing 400044, Peoples R China
  • [ 4 ] Beijing Univ Technol, Quantum Mat Lab, Beijing 100022, Peoples R China

Reprint Author's Address:

  • [Wang, BB]Beijing Univ Technol, Coll Appl Math & Phys, 100 Pingleyuan, Beijing 100022, Peoples R China

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Source :

APPLIED SURFACE SCIENCE

ISSN: 0169-4332

Year: 2004

Issue: 1-4

Volume: 236

Page: 6-12

6 . 7 0 0

JCR@2022

ESI Discipline: MATERIALS SCIENCE;

JCR Journal Grade:2

Cited Count:

WoS CC Cited Count: 17

SCOPUS Cited Count: 16

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 6

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