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Author:

陈光华 (陈光华.) | 张阳 (张阳.) | 张生俊 (张生俊.) | 宋雪梅 (宋雪梅.) | 李英兰 (李英兰.)

Indexed by:

CQVIP PKU CSCD

Abstract:

介绍了用微波CVD法制备的一种新型低阈值电压大电流密度金刚石薄膜场发射冷阴极,阈值电压低于1.09V/m,场发射电流密度高达418mA/cm2,这是目前文献中报道的最好结果之一.文中还探讨了金刚石薄膜场电子发射机制.

Keyword:

场电子发射 负电子亲和势(NEA) 金刚石薄膜

Author Community:

  • [ 1 ] [陈光华]北京工业大学
  • [ 2 ] [张阳]北京理工大学
  • [ 3 ] [张生俊]北京工业大学
  • [ 4 ] [宋雪梅]北京工业大学
  • [ 5 ] [李英兰]北京工业大学

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Source :

北京工业大学学报

ISSN: 0254-0037

Year: 2000

Issue: 3

Volume: 26

Page: 116-119

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count: 5

Chinese Cited Count:

30 Days PV: 4

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