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Author:

Ma, Limin (Ma, Limin.) | Xu, Guangchen (Xu, Guangchen.) | Guo, Fu (Guo, Fu.) (Scholars:郭福) | Wang, Xitao (Wang, Xitao.)

Indexed by:

CPCI-S

Abstract:

Electromigration (EM) has become one of the reliability concerns to the fine pitch solder joint due to its increasing capacity to bear the high current density The EM effects on microstructure evolution of Sn-3.0Ag-0.5Cu+XNi (X=0, 0.05, 0.45, 2.0wt. %) solder joint was investigated. Findings of this study indicated that an appropriate addition of Ni element and moderate ambient temperature can alleviate EM damages in solder joint. The intermetallic compound layer which held a planar type and appropriate thickness improved the resistance of EM effects by suppressing the polarity effect. Ag3Sn and the bulk IMCs also retard the effects from current stressing for the solder joint.

Keyword:

Author Community:

  • [ 1 ] [Ma, Limin]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 2 ] [Xu, Guangchen]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 3 ] [Guo, Fu]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 4 ] [Wang, Xitao]Univ Sci & Technol Beijing, State Key Lab Adv Met & Mat, Beijing 100083, Peoples R China

Reprint Author's Address:

  • [Ma, Limin]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China

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Source :

2011 12TH INTERNATIONAL CONFERENCE ON ELECTRONIC PACKAGING TECHNOLOGY AND HIGH DENSITY PACKAGING (ICEPT-HDP)

Year: 2011

Page: 195-199

Language: English

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 6

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