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Author:

You, Congya (You, Congya.) | Deng, Wenjie (Deng, Wenjie.) | Chen, Xiaoqing (Chen, Xiaoqing.) | Zhou, Wencai (Zhou, Wencai.) | Zheng, Zilong (Zheng, Zilong.) | An, Boxing (An, Boxing.) | Li, Songyu (Li, Songyu.) | Wang, Bo (Wang, Bo.) (Scholars:王波) | Zhang, Yongzhe (Zhang, Yongzhe.) (Scholars:张永哲)

Indexed by:

EI Scopus SCIE

Abstract:

The vertical van der Waals heterostructures based on 2-D materials have attracted tremendous attention in optoelectronic devices as they can offer perfect interface without dangling bonds, atomic layer thicknesses, and conveniently tunable energy band alignment. However, the carrier transport mechanism in vertically stacked van der Waals heterostructure photodetectors is usually neglected in regards of photoresponse enhancement strategy, leading to low photoresponsivity and quantum efficiency. Here, we report a vertically stacked tunneling photodetector based on WSe2/graphene/WS2 van der Waals heterostructure. By introducing graphene film into the WSe2/WS2 interface, the interface composition was ameliorated and the Fowler-Nordheim tunneling (FNT) was enhanced with the reduced tunneling barrier height and thickness, caused by the elevated energy level of electrons since strong electron-electron interaction, ultrafast thermalization (similar to 50 fs), and massless Dirac electrons of graphene. Therefore, the device exhibits a high photocurrent/dark current ratio (>10(4)), fast response time (similar to 300 mu s), high detectivity (similar to 1.58 x 10(12) Jones), and high responsivity (429 mA W-1) across a broad spectral range till 1 mu m at room temperature. The optimized detectivity and responsivity are about 150 times and 50 times higher than WSe2/WS2 device without graphene, respectively. These results contribute to offer a novel and versatile strategy for overcoming the performance limitation in van der Waals photodetector.

Keyword:

Electrodes Performance evaluation tunneling Photodetectors Graphene Tunneling heterojunction photodetector Substrates Heterojunctions

Author Community:

  • [ 1 ] [You, Congya]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China
  • [ 2 ] [Deng, Wenjie]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China
  • [ 3 ] [Chen, Xiaoqing]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China
  • [ 4 ] [Zhou, Wencai]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China
  • [ 5 ] [Zheng, Zilong]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China
  • [ 6 ] [An, Boxing]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China
  • [ 7 ] [Li, Songyu]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China
  • [ 8 ] [Wang, Bo]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China
  • [ 9 ] [Zhang, Yongzhe]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China
  • [ 10 ] [You, Congya]Minist Educ, Key Lab Adv Funct Mat, Beijing 100124, Peoples R China
  • [ 11 ] [Deng, Wenjie]Minist Educ, Key Lab Adv Funct Mat, Beijing 100124, Peoples R China
  • [ 12 ] [Chen, Xiaoqing]Minist Educ, Key Lab Adv Funct Mat, Beijing 100124, Peoples R China
  • [ 13 ] [Zhou, Wencai]Minist Educ, Key Lab Adv Funct Mat, Beijing 100124, Peoples R China
  • [ 14 ] [Zheng, Zilong]Minist Educ, Key Lab Adv Funct Mat, Beijing 100124, Peoples R China
  • [ 15 ] [An, Boxing]Minist Educ, Key Lab Adv Funct Mat, Beijing 100124, Peoples R China
  • [ 16 ] [Li, Songyu]Minist Educ, Key Lab Adv Funct Mat, Beijing 100124, Peoples R China
  • [ 17 ] [Wang, Bo]Minist Educ, Key Lab Adv Funct Mat, Beijing 100124, Peoples R China
  • [ 18 ] [Zhang, Yongzhe]Beijing Univ Technol, Key Lab Optoelect Technol, Minist Educ, Beijing 100124, Peoples R China

Reprint Author's Address:

  • 张永哲

    [Zhang, Yongzhe]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China

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Source :

IEEE TRANSACTIONS ON ELECTRON DEVICES

ISSN: 0018-9383

Year: 2021

Issue: 4

Volume: 68

Page: 1702-1709

3 . 1 0 0

JCR@2022

ESI Discipline: ENGINEERING;

ESI HC Threshold:87

JCR Journal Grade:2

Cited Count:

WoS CC Cited Count: 18

SCOPUS Cited Count: 19

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 9

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