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Author:

Ding, Jiaqi (Ding, Jiaqi.) | Guo, Ruiqi (Guo, Ruiqi.) | Hu, Jingcong (Hu, Jingcong.) | Xi, Guoqiang (Xi, Guoqiang.) | Lu, Yue (Lu, Yue.) | Tian, Jianjun (Tian, Jianjun.) | Zhang, Linxing (Zhang, Linxing.)

Indexed by:

EI Scopus SCIE

Abstract:

The proposal of the ferroelectric photovoltaic effect provides a spick-and-span concept for breaking through the bottleneck of traditional heterojunction energy conversion and the photoelectric memory device. However, the wide bandgap, low carrier transport capacity, and small photocurrent of ferroelectric materials limit its ferro-electric photovoltaic applications. Here, chemical regulation of cobalt substitution has been used to effectively reduce bandgap and improve ferroelectric photovoltaic properties. High-quality Co-substituted BiFeO(3 )epitaxial films were fabricated by magnetron sputtering. The enhanced tetragonality can be obtained by introducing the chemical strain of cobalt. The ferroelectric properties of present films have been significantly improved with a fivefold increase in remnant polarization, resulting from the enhanced lattice distortion of the oxygen octahedron. The enhanced hybridization of electron orbitals and the atomic structure has been revealed by synchrotron radiation and the high-resolution HAADF-STEM. Intriguingly, the optical bandgap has been reduced from 1.97 eV to1.47 eV, which is close to the ideal bandgap. The switchable ferroelectric photovoltaic can be realized by changing the direction of polarization, and the open-circuit voltage and short-circuit current have increased to 1.7 and 1.8 times, respectively. This work further reveals the application potential of chemical-strain-modulated epitaxial films in the field of optoelectronics and information storage.

Keyword:

Chemical strain XAS BiFeO3 based thin films Ferroelectric photovoltaic Bandgap adjustment

Author Community:

  • [ 1 ] [Ding, Jiaqi]Univ Sci & Technol Beijing, Inst Adv Mat Technol, Beijing 100083, Peoples R China
  • [ 2 ] [Xi, Guoqiang]Univ Sci & Technol Beijing, Inst Adv Mat Technol, Beijing 100083, Peoples R China
  • [ 3 ] [Tian, Jianjun]Univ Sci & Technol Beijing, Inst Adv Mat Technol, Beijing 100083, Peoples R China
  • [ 4 ] [Zhang, Linxing]Univ Sci & Technol Beijing, Inst Adv Mat Technol, Beijing 100083, Peoples R China
  • [ 5 ] [Guo, Ruiqi]Soochow Univ, Sch Iron & Steel, Suzhou 215000, Peoples R China
  • [ 6 ] [Hu, Jingcong]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Fac Mat & Mfg, Beijing 100124, Peoples R China
  • [ 7 ] [Lu, Yue]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Fac Mat & Mfg, Beijing 100124, Peoples R China

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Source :

APPLIED SURFACE SCIENCE

ISSN: 0169-4332

Year: 2022

Volume: 606

6 . 7

JCR@2022

6 . 7 0 0

JCR@2022

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:66

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 12

SCOPUS Cited Count: 12

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 6

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