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Author:

Wang, Xiaolei (Wang, Xiaolei.) (Scholars:王晓蕾) | Zhang, Chen (Zhang, Chen.) | Yang, Qianqian (Yang, Qianqian.) | Liu, Lei (Liu, Lei.) | Pan, Dong (Pan, Dong.) | Chen, Xue (Chen, Xue.) | Deng, Jinxiang (Deng, Jinxiang.) | Zhai, Tianrui (Zhai, Tianrui.) | Deng, Hui-Xiong (Deng, Hui-Xiong.)

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EI Scopus SCIE

Abstract:

The Mn3X (where X = Ga, Ge, Sn, etc.) compounds have appealing prospects for spintronic applications due to their various crystal structures and magnetic properties for the design of reliable high-density memories. However, controlled growth of high-quality Mn3X thin films remains challenging in material science. Here, we reported the controlled film growth of Heusler alloy Mn3Ge, which could crystallize in respective tetragonal and hexagonal structures. The tetragonal D0(22)-type Mn3Ge film exhibits strong perpendicular ferromagnetic anisotropy, while the hexagonal D0(19)-type Mn3Ge film indicates non-collinear triangular antiferromagnetic order. From our experimental observations of structure characterizations, magnetic properties, anomalous Hall effect, and magnetoresistance measurements, we realized the manipulation of spin orientations and topological features. Majority/minority spin polarized Fermi surface and density of states of both tetragonal and hexagonal Mn3Ge structures were investigated by density functional theory calculations. Our work not only opens up technology routes toward the development of Mn3X-based devices for applications in topological spintronics and spin-torque memories but also leads to engineer the physical properties for fundamental study.(c) 2021 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license(http://creativecommons.org/licenses/by/4.0/).

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Author Community:

  • [ 1 ] [Wang, Xiaolei]Beijing Univ Technol, Fac Sci, Sch Phys & Optoelect, Beijing 100124, Peoples R China
  • [ 2 ] [Yang, Qianqian]Beijing Univ Technol, Fac Sci, Sch Phys & Optoelect, Beijing 100124, Peoples R China
  • [ 3 ] [Deng, Jinxiang]Beijing Univ Technol, Fac Sci, Sch Phys & Optoelect, Beijing 100124, Peoples R China
  • [ 4 ] [Zhai, Tianrui]Beijing Univ Technol, Fac Sci, Sch Phys & Optoelect, Beijing 100124, Peoples R China
  • [ 5 ] [Zhang, Chen]Chinese Acad Sci, Inst Semicond, State Key Lab Superlattices & Microstruct, Beijing 100083, Peoples R China
  • [ 6 ] [Liu, Lei]Chinese Acad Sci, Inst Semicond, State Key Lab Superlattices & Microstruct, Beijing 100083, Peoples R China
  • [ 7 ] [Pan, Dong]Chinese Acad Sci, Inst Semicond, State Key Lab Superlattices & Microstruct, Beijing 100083, Peoples R China
  • [ 8 ] [Deng, Hui-Xiong]Chinese Acad Sci, Inst Semicond, State Key Lab Superlattices & Microstruct, Beijing 100083, Peoples R China
  • [ 9 ] [Chen, Xue]Chinese Acad Sci, Inst Semicond, Engn Res Ctr Semicond Integrated Technol, Beijing 100083, Peoples R China

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Source :

APL MATERIALS

ISSN: 2166-532X

Year: 2021

Issue: 11

Volume: 9

6 . 1 0 0

JCR@2022

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:116

JCR Journal Grade:1

Cited Count:

WoS CC Cited Count: 6

SCOPUS Cited Count: 5

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 11

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