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Author:

Wu, Jie (Wu, Jie.) | Yang, Maolin (Yang, Maolin.) | Lu, Ping (Lu, Ping.) | Wei, Kejian (Wei, Kejian.) | Qu, Yao (Qu, Yao.) | Zhang, Yifan (Zhang, Yifan.) | Li, Dejun (Li, Dejun.)

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EI Scopus SCIE

Abstract:

Herein, we report a robust and efficient approach to build a MXene embedded TiO2 composite thin film in situ on Ti foil via the plasma discharge process in aqueous solution. The plasma electron temperature fluctuates from 4000 K of the initial discharge to 6000 K of the stable discharge, accompanied by frequency variation of the acoustic signal. The fabricated composite film presents a porous morphology with 3D skeletal TiO2/MXene and uniformly distributed SiO2 nano-particles, which guarantees the superior Li storage performance when serves as the Li-ion battery anode. Its specific capacity can stabilize above 2300 mAh g(-1) at the current density of 0.1 A g(-1), together with an excellent rate capability. This work provides a promising route for the one-step synthesis of binder-free oxide anodes without the anfractuous pretreatments or post-treatments. Published under an exclusive license by AIP Publishing.

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Author Community:

  • [ 1 ] [Wu, Jie]Tianjin Normal Univ, Coll Phys & Mat Sci, Tianjin Int Joint Res Ctr Surface Technol Energy S, Tianjin 300387, Peoples R China
  • [ 2 ] [Yang, Maolin]Tianjin Normal Univ, Coll Phys & Mat Sci, Tianjin Int Joint Res Ctr Surface Technol Energy S, Tianjin 300387, Peoples R China
  • [ 3 ] [Lu, Ping]Tianjin Normal Univ, Coll Phys & Mat Sci, Tianjin Int Joint Res Ctr Surface Technol Energy S, Tianjin 300387, Peoples R China
  • [ 4 ] [Li, Dejun]Tianjin Normal Univ, Coll Phys & Mat Sci, Tianjin Int Joint Res Ctr Surface Technol Energy S, Tianjin 300387, Peoples R China
  • [ 5 ] [Wei, Kejian]Henan Univ, Sch Mat Sci & Engn, Key Lab Special Funct Mat Minist Educ, Kaifeng 475004, Peoples R China
  • [ 6 ] [Qu, Yao]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
  • [ 7 ] [Zhang, Yifan]Chinese Inst Coal Sci, Beijing 100013, Peoples R China

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Source :

APPLIED PHYSICS LETTERS

ISSN: 0003-6951

Year: 2022

Issue: 19

Volume: 121

4 . 0

JCR@2022

4 . 0 0 0

JCR@2022

ESI Discipline: PHYSICS;

ESI HC Threshold:41

JCR Journal Grade:2

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 1

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 4

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