Ceramic　slurries　play　an　essential　role　in　the　fabrication　of　complex　ceramic　parts　in　ceramic　stereolithography　(CSL),　in　which　photosensitive　monomer　is　the　focus.　In　this　study,　the　comprehensive　properties　of　commonly　used　monomers　were　quantitatively　studied　by　a　new　evaluation　system.　As　a　result,　ACMO,　PONPGDA　and　EOTMPTA　were　selected　as　the　final　three　monomers　with　better　properties.　On　this　basis,　an　optimal　combi-nation　of　the　above　monomers　with　the　best　comprehensive　performance　was　obtained　by　blending　them　at　a　ratio　of　60:60:40.　Next,　the　influence　of　different　resins　on　the　properties　of　alumina　slurries　was　investigated.　It　was　found　that　using　the　mixture　of　the　above　three　monomers,　an　excellent　as-prepared　slurry　with　low　vis-cosity,　small　shrinkage　and　good　photo-curable　ability　was　obtained.