Mo　thin　films　are　the　preferred　material　for　the　back　electrode　of　CIGS　solar　cells,　which　puts　forward　great　demands　on　the　adhesion　strength　between　the　thin　films　and　the　substrate.　To　improve　the　adhesion　strength,　the　effect　of　three　factors　(depositing　temperature,　vacuum　degree,　and　sputtering　power)　on　adhesion　strength　with　the　help　of　L9(33)　orthogonal　table　was　studied　and　three　levels　were　selected　for　each　factor.　The　indentation　method　was　used　to　measure　the　adhesion　strength　between　films　and　substrates.　The　evaluation　criterion　of　the　adhesion　strength　was　the　area　of　indentation-induced　cracks,　which　could　be　obtained　by　the　improved　Uddeholm　method.　Through　range　analysis,　the　R　values　of　depositing　temperature,　vacuum　degree,　and　sputtering　power　were　6.51,　18.29,　and　5.96,　respectively.　The　optimal　combination　was　A1B2C3,　and　the　area　of　cracks　was　the　smallest　at　that　time,　which　was　2.41.　Results　show　that　the　effect　of　vacuum　degree　on　adhesion　strength　is　the　largest,　then　depositing　temperature,　while　the　effect　of　sputtering　power　is　the　least.　Considering　the　three　factors,　the　optimal　sputtering　parameter　combination　is:　power　150　W,　pressure　0.5　Pa,　and　temperature　100　℃.　©　2022,　Editorial　Department　of　Journal　of　Beijing　University　of　Technology.　All　right　reserved.