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Author:

Li, Yanmin (Li, Yanmin.) | Meng, Junhua (Meng, Junhua.) (Scholars:孟军华) | Duan, Ping (Duan, Ping.) | Wu, Rui (Wu, Rui.) | Shi, Yiming (Shi, Yiming.) | Zhang, Lisheng (Zhang, Lisheng.) | Yan, Chunxia (Yan, Chunxia.) | Deng, Jinxiang (Deng, Jinxiang.) | Zhang, Xingwang (Zhang, Xingwang.)

Indexed by:

EI Scopus SCIE

Abstract:

A large number of defect states that exist at the interface between a perovskite film and an electron transport layer (ETL) are detrimental to the efficiency and the stability of perovskite solar cells (PSCs). It is still a challenge to simultaneously passivate the defects on both sides by a stable and low-cost ion compound. Herein, we demonstrate a simple and effective versatile strategy by introducing hydrochloric acid into SnO2 precursor solution to passivate the defects in both SnO2 and perovskite layers and simultaneously reduce the interface energy barrier, ultimately achieving a high-performance and hysteresis-free PSCs. Hydrogen ions can neutralize -OH groups on the SnO2 surface, whereas the Cl- can not only combine with Sn4+ in ETL but also suppress the Pb-I antisite defects formed at the buried interface. The reduced nonradiative recombination and the favorable energy level alignment result in a significantly increased efficiency from 20.71 to 22.06% of PSCs due to the enhancement of open-circuit voltage. In addition, the stability of the device can also be improved. This work presents a facile and promising approach for the development of highly efficient PSCs.

Keyword:

SnO2 hydrochloric acid interface engineering electron transport layer perovskite solar cells

Author Community:

  • [ 1 ] [Li, Yanmin]Beijing Univ Technol, Fac Sci, Beijing 100124, Peoples R China
  • [ 2 ] [Meng, Junhua]Beijing Univ Technol, Fac Sci, Beijing 100124, Peoples R China
  • [ 3 ] [Duan, Ping]Beijing Univ Technol, Fac Sci, Beijing 100124, Peoples R China
  • [ 4 ] [Wu, Rui]Beijing Univ Technol, Fac Sci, Beijing 100124, Peoples R China
  • [ 5 ] [Shi, Yiming]Beijing Univ Technol, Fac Sci, Beijing 100124, Peoples R China
  • [ 6 ] [Zhang, Lisheng]Beijing Univ Technol, Fac Sci, Beijing 100124, Peoples R China
  • [ 7 ] [Yan, Chunxia]Beijing Univ Technol, Fac Sci, Beijing 100124, Peoples R China
  • [ 8 ] [Deng, Jinxiang]Beijing Univ Technol, Fac Sci, Beijing 100124, Peoples R China
  • [ 9 ] [Zhang, Xingwang]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 10 ] [Zhang, Xingwang]Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China

Reprint Author's Address:

  • 孟军华

    [Meng, Junhua]Beijing Univ Technol, Fac Sci, Beijing 100124, Peoples R China

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Source :

ACS APPLIED MATERIALS & INTERFACES

ISSN: 1944-8244

Year: 2023

Issue: 19

Volume: 15

Page: 23208-23216

9 . 5 0 0

JCR@2022

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:26

Cited Count:

WoS CC Cited Count: 13

SCOPUS Cited Count: 13

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 9

Affiliated Colleges:

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