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Abstract:
一种无缺陷羟基氧化钴纳米片的一步飞秒激光制备方法,属于激光加工领域。本发明使用飞秒激光液相辐照加工技术,在氢氧化钾液相体系中对高纯钴靶材进行液相辐照,制备获得单晶羟基氧化钴纳米片,该纳米片可用于析氢催化反应与生物检测等。
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Patent Info :
Type: 发明申请
Patent No.: CN202310263090.2
Filing Date: 2023-03-17
Publication Date: 2023-07-18
Pub. No.: CN116446031A
Applicants: 北京工业大学
Legal Status: 实质审查
Cited Count:
WoS CC Cited Count: 0
SCOPUS Cited Count:
ESI Highly Cited Papers on the List: 0 Unfold All
WanFang Cited Count:
Chinese Cited Count:
30 Days PV: 3
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