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Abstract:
本发明公开了一种Si基双面电池隧道结的结构及其制备方法,包括:N型Si衬底和N型AlxGa1‑xAs层;N型Si衬底的上下表面分别掺杂形成P+型Si层和N+型Si层,P+型Si层上依次形成有N+型Si隧道结层和N型Si层;N型AlxGa1‑xAs层的上下表面分别掺杂形成P+型AlxGa1‑xAs层和N+型AlxGa1‑xAs层,N+型AlxGa1‑xAs层上形成有N型Si层;N型Si衬底的N型Si层与N型AlxGa1‑xAs层的N型Si层键合连接,形成N型Si键合层;P+型AlxGa1‑xAs层和N+型Si层上分别形成减反射膜和透明导电薄膜,上下的透明导电薄膜上分别形成正面电极和背面电极。本发明通过沉积隧道结来实现AlGaAs电池与Si电池的集成,其提高了吸收系数且降低了Si片的厚度,从而降低了成本,有利于柔性太阳能电池的制备。
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Patent Info :
Type: 发明申请
Patent No.: CN202111211738.9
Filing Date: 2021-10-18
Publication Date: 2024-03-29
Pub. No.: CN113937180B
Applicants: 北京工业大学
Legal Status: 授权
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ESI Highly Cited Papers on the List: 0 Unfold All
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30 Days PV: 7
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