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Author:

Zhou, M. (Zhou, M..) | Jiang, H. (Jiang, H..) | Hou, T. (Hou, T..) | Hou, S. (Hou, S..) | Li, J. (Li, J..) | Chen, X. (Chen, X..) | Di, C. (Di, C..) | Xiao, J. (Xiao, J..) | Li, H. (Li, H..) | Ju, D. (Ju, D..)

Indexed by:

EI Scopus SCIE

Abstract:

Hybrid metal halides are emerging candidates for X-ray imaging. Due to the poor uniformity, low transmittance and high light scattering of polycrystalline film scintillator screen, resulting in low resolution of X-ray imaging, it is essential a challenging to explore new large-area and single crystal scintillator with high light yield and high resolution. Herein, inch-sized Mn-based halide single crystals, (C25H22P)2MnCl4 and (C25H22P)2MnBr4, with tunable thickness films from 0.12 mm to 0.72 mm were designed and grown. The crystals of (C25H22P)2MnCl4 and (C25H22P)2MnBr4 with high photoluminescence quantum yield (PLQY) of 62.42 % and 99.10 % exhibit high light yield of 56,457 and 78,937 photons/MeV under X-ray, which is 1.7 and 2.37 times higher than that of the commercial LYSO scintillator. Both the crystals show high X-ray radiation resistance even exposed to X-ray for 60 mins with a high dose rate of 504 mGy s−1. The high photochemical stability under the continuous UV and X-ray irradiation contributes them towards X‑ray imaging. With such significant merits, the high spatial resolutions about 21.02 and 25.61 lp/mm are achieved on the (C25H22P)2MnCl4 and (C25H22P)2MnBr4 single crystal films, which demonstrates the great potential of large size single crystal screen for commercial high-resolution X-ray imaging applications. © 2024 Elsevier B.V.

Keyword:

Inch-size Hybrid manganese halide single-crystal films Scintillators X-ray imaging Tunable thickness

Author Community:

  • [ 1 ] [Zhou M.]College of Materials Science and Engineering, Qingdao University of Science and Technology, Qingdao, 260042, China
  • [ 2 ] [Jiang H.]Department of Respiratory and Critical Care Medicine, Qingdao Eighth People′s Hospital, Qingdao, 266121, China
  • [ 3 ] [Hou T.]College of Materials Science and Engineering, Qingdao University of Science and Technology, Qingdao, 260042, China
  • [ 4 ] [Hou S.]College of Materials Science and Engineering, Qingdao University of Science and Technology, Qingdao, 260042, China
  • [ 5 ] [Li J.]Beijing Key Lab of Microstructure and Property of Advanced Materials, College of Materials Science and Engineering, Beijing University of Technology, Beijing, 100124, China
  • [ 6 ] [Chen X.]College of Materials Science and Engineering, Qingdao University of Science and Technology, Qingdao, 260042, China
  • [ 7 ] [Di C.]College of Materials Science and Engineering, Qingdao University of Science and Technology, Qingdao, 260042, China
  • [ 8 ] [Xiao J.]Beijing Key Lab of Microstructure and Property of Advanced Materials, College of Materials Science and Engineering, Beijing University of Technology, Beijing, 100124, China
  • [ 9 ] [Li H.]College of Electromechanical Engineering, Qingdao University of Science and Technology, Qingdao, 266061, China
  • [ 10 ] [Ju D.]College of Materials Science and Engineering, Qingdao University of Science and Technology, Qingdao, 260042, China

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Source :

Chemical Engineering Journal

ISSN: 1385-8947

Year: 2024

Volume: 490

1 5 . 1 0 0

JCR@2022

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 7

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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