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Author:

Mu, Yue Wei (Mu, Yue Wei.) | Dong, Hai Liang (Dong, Hai Liang.) | Jia, Zhi Gang (Jia, Zhi Gang.) | Jia, Wei (Jia, Wei.) | Liang, Jian (Liang, Jian.) | Wang, Zhi Yong (Wang, Zhi Yong.) | Xu, Bing She (Xu, Bing She.)

Indexed by:

EI Scopus SCIE

Abstract:

An asymmetric InAlGaN/GaN superlattice barrier structure without the first quantum barrier layer (FQB) is designed, and its effect on the optoelectronic performance of GaN-based green laser diode (LD) has been investigated based on simulation experiment and analytical results. It is found that, compared with conventional GaN barrier LD, device performance is significantly improved by using FQB-free asymmetric InAlGaN/GaN superlattice barrier structure, including low threshold current, high output power, and high photoelectric conversion efficiency. The threshold current of LD with novel structure is 16.19 mA, which is 22.46% less than GaN barrier LD. Meanwhile, the output power is 110.69 mW at an injection current of 120 mA, which is 16.20% higher compared to conventional LD, and the wall-plug efficiency has an enhancement of 9.5%, reaching 20.27%. FQB-free asymmetric InAlGaN/GaN superlattice barrier layer can reduce optical loss, suppress the polarization effect, and improve the carrier injection efficiency, which is beneficial to improve output power and photoelectric conversion efficiency. The novel epitaxial structure provides theoretical guidance and data support for improving the optoelectronic performance of GaN-based green LD.

Keyword:

GaN-based laser diode optoelectronic performance laser asymmetric InAlGaN/GaN superlattice barrier

Author Community:

  • [ 1 ] [Mu, Yue Wei]Taiyuan Univ ofTechnol, Key Lab Interface Sci & Engn Adv Mat, Minist Educ, Taiyuan 030024, Peoples R China
  • [ 2 ] [Dong, Hai Liang]Taiyuan Univ ofTechnol, Key Lab Interface Sci & Engn Adv Mat, Minist Educ, Taiyuan 030024, Peoples R China
  • [ 3 ] [Jia, Zhi Gang]Taiyuan Univ ofTechnol, Key Lab Interface Sci & Engn Adv Mat, Minist Educ, Taiyuan 030024, Peoples R China
  • [ 4 ] [Jia, Wei]Taiyuan Univ ofTechnol, Key Lab Interface Sci & Engn Adv Mat, Minist Educ, Taiyuan 030024, Peoples R China
  • [ 5 ] [Xu, Bing She]Taiyuan Univ ofTechnol, Key Lab Interface Sci & Engn Adv Mat, Minist Educ, Taiyuan 030024, Peoples R China
  • [ 6 ] [Dong, Hai Liang]Shanxi Zheda Inst Adv Mat & Chem Engn, Taiyuan 030024, Shanxi, Peoples R China
  • [ 7 ] [Jia, Wei]Shanxi Zheda Inst Adv Mat & Chem Engn, Taiyuan 030024, Shanxi, Peoples R China
  • [ 8 ] [Xu, Bing She]Shanxi Zheda Inst Adv Mat & Chem Engn, Taiyuan 030024, Shanxi, Peoples R China
  • [ 9 ] [Liang, Jian]Taiyuan Univ Technol, Coll Mat Sci & Engn, Taiyuan 030024, Peoples R China
  • [ 10 ] [Wang, Zhi Yong]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 11 ] [Xu, Bing She]Shaanxi Univ Sci & Technol, Inst Atom & Mol Sci, Xian 710021, Peoples R China

Reprint Author's Address:

  • [Dong, Hai Liang]Taiyuan Univ ofTechnol, Key Lab Interface Sci & Engn Adv Mat, Minist Educ, Taiyuan 030024, Peoples R China;;[Dong, Hai Liang]Shanxi Zheda Inst Adv Mat & Chem Engn, Taiyuan 030024, Shanxi, Peoples R China;;

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Source :

ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY

ISSN: 2162-8769

Year: 2024

Issue: 5

Volume: 13

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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