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Author:

Pan, Shijie (Pan, Shijie.) | Feng, Shiwei (Feng, Shiwei.) (Scholars:冯士维) | Li, Xuan (Li, Xuan.) | Feng, Zixuan (Feng, Zixuan.) | Lu, Xiaozhuang (Lu, Xiaozhuang.) | Bai, Kun (Bai, Kun.) | Zhang, Yamin (Zhang, Yamin.)

Indexed by:

EI Scopus

Abstract:

In this study, the effects of 1 MeV electron radiation on the D-mode GaN-based high electron mobility transistors (HEMTs) were investigated after different radiation doses. The changes in electrical properties of the device were obtained, and the related physical mechanisms were analyzed. It indicated that under the radiation dose of 5 x 1014 cm-2, the channel current cannot be completely pinched off even if the negative gate voltage was lower than the threshold voltage, and the gate leakage current increased significantly. The emission microscopy and scanning electron microscopy were used to determine the damage location. Besides, the radiation dose was adjusted ranging from 5 x 1012 to 1 x 1014 cm-2, and we noticed that the drain-source current increased and the threshold voltage presented slightly negative shift. By calculations, it suggested that the carrier density and electron mobility gradually increased. It provided a reference for the development of device radiation reinforcement technology.

Keyword:

AlGaN/GaN HEMT electron radiation device damage performance degradation

Author Community:

  • [ 1 ] [Pan, Shijie]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 2 ] [Feng, Shiwei]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 3 ] [Feng, Zixuan]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 4 ] [Lu, Xiaozhuang]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 5 ] [Bai, Kun]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 6 ] [Zhang, Yamin]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 7 ] [Li, Xuan]Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China

Reprint Author's Address:

  • [Feng, Shiwei]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China;;

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Source :

JOURNAL OF SEMICONDUCTORS

ISSN: 1674-4926

Year: 2024

Issue: 9

Volume: 45

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 8

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