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Author:

Liu, Xue-Jie (Liu, Xue-Jie.) | Zhang, Su-Hui (Zhang, Su-Hui.) | Jiang, Yong-Jun (Jiang, Yong-Jun.) | Ren, Yuan (Ren, Yuan.) | Tan, Xin (Tan, Xin.)

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Abstract:

In order to research into the microscopic behavior of interface particles in nano diamond composite films, the adsorption and diffusion behavior of carbon and silicon particles on diamond (001) surface has been calculated through the first principle method. The configuration energy and adsorption energy of carbon and silicon particles at four high symmetric locations on the diamond (001) surface were calculated, and the diffusion activation energy was also obtained. It turned out that the stable configuration is along with the diamond (001) growth orientation. In addition, the diffusion activation energy of carbon particle and silicon particle are respectively 2.824 eV and 0.475 eV. The difference between two activation energies illustrated that silicon particle can significantly promote carbon particle's diffusion, in which the denser nano diamond composite film can be formed.

Keyword:

Interfaces (materials) Activation energy Silicon Diamonds Adsorption Nanodiamonds Composite films Diffusion

Author Community:

  • [ 1 ] [Liu, Xue-Jie]School of Mechanical Engineering, Inner Mongolia University of Science and Technology, Baotou 014010, China
  • [ 2 ] [Liu, Xue-Jie]Gengdan Institute of Beijing University of Technology, Beijing 101301, China
  • [ 3 ] [Zhang, Su-Hui]School of Mechanical Engineering, Inner Mongolia University of Science and Technology, Baotou 014010, China
  • [ 4 ] [Jiang, Yong-Jun]School of Mechanical Engineering, Inner Mongolia University of Science and Technology, Baotou 014010, China
  • [ 5 ] [Ren, Yuan]School of Mechanical Engineering, Inner Mongolia University of Science and Technology, Baotou 014010, China
  • [ 6 ] [Tan, Xin]School of Mechanical Engineering, Inner Mongolia University of Science and Technology, Baotou 014010, China

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Source :

Journal of Synthetic Crystals

ISSN: 1000-985X

Year: 2014

Issue: 3

Volume: 43

Page: 625-630,647

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 4

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