We　develop　compact　microsphere　self-interference　lithography　via　a　single　laser　beam　incident　into　a　self-assembled　dual-layered　microsphere　array　to　achieve　parallel　fabrication　of　periodic　units　with　nanopatterns　(PUNs).　Interference　units　with　tens　of　millions　are　achieved　through　micron-thick　dual-layered　microsphere　arrays.　The　periodic　units　with　nanoholes　(NHs),　nanogrooves　(NGs),　and　nanoslots　(NSs)　can　be　fabricated　by　simply　varying　incident　laser　polarization　states.　The　minimum　linewidth　is　75　nm　(similar　to　lambda/4.5),　and　the　single-shot　exposure　area　is　up　to　1　cm2.　An　analytical　model　of　polarization-dependent　tri-beam　interferences　is　developed　to　interpret　the　PUN　formation.　Au-coated　PUNs　demonstrate　extraordinary　performance　for　customized　surface-enhanced　Raman　spectroscopy　substrates,　of　which　the　polarization　sensitivity　can　be　regulated　and　the　limit　of　detection　is　down　to　3　x　10-10　M.　The　present　work　opens　up　new　opportunities　for　high-throughput　laser　parallel　nanofabrication　for　various　applications.　(c)　2025　Optica　Publishing　Group.　All　rights,　including　for　text　and　data　mining　(TDM),　Artificial　Intelligence　(AI)　training,　and　similar　technologies,　are　reserved.