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Author:

Sun, Mei (Sun, Mei.) | Xu, De-gang (Xu, De-gang.) | Yao, Jian-quan (Yao, Jian-quan.)

Indexed by:

EI Scopus

Abstract:

The golden films with various subwavelength hole arrays on the film surface are designed and fabricated on glass substrate by electron beam lithograply (EBL), focused ion beam (FIB), and reactive ion etching (RIE), respectively. The influences of the hole array symmetry and the hole shape on the light-enhanced transmission through the films are observed and simulated. The experimental results show that when the array lattice constant and the hole diameter are the same in the different array structures which are 1 μm and 350 nm respectively, the square hole arrays exhibit two transmission peaks at 1170 nm and 1580 nm with the transmissivities of 3% and 6%, respectively, while the hexagonal hole arrays exhibit an enhanced peak of 14% at 1340 nm; when the lattice constant and the duty cycle are the same for different array stucture, the transmission peaks are different for different hole shapes, which are at 763 nm with transmissivity of 12% for rectangular holes and at 703 nm with the one of 9%, respectively. The numerical simulation results by using the transfer matrix method (TMM) are consistent with the observed results. © Tianjin University of Technology and Springer-Verlag 2009.

Keyword:

Substrates Light transmission Numerical methods Ion beams Lattice constants Reactive ion etching Transmissions Transfer matrix method

Author Community:

  • [ 1 ] [Sun, Mei]School of Information Engineering, Beijing University of Technology and Business, Beijing 100048, China
  • [ 2 ] [Xu, De-gang]Key Laboratory of Optoelectronics Information and Technical Science, Ministry of Education, Institute of Lasers and Optoelectronics, College of Precision Instrument and Optoelectronic Engineering, Tianjin University, Tianjin 300072, China
  • [ 3 ] [Yao, Jian-quan]Key Laboratory of Optoelectronics Information and Technical Science, Ministry of Education, Institute of Lasers and Optoelectronics, College of Precision Instrument and Optoelectronic Engineering, Tianjin University, Tianjin 300072, China

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Source :

Optoelectronics Letters

ISSN: 1673-1905

Year: 2009

Issue: 4

Volume: 5

Page: 317-320

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 4

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 6

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