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Author:

Hu, Anqi (Hu, Anqi.) | Tian, Huijun (Tian, Huijun.) | Liu, Qiaoli (Liu, Qiaoli.) | Wang, Lei (Wang, Lei.) | Wang, Lai (Wang, Lai.) | He, Xiaoying (He, Xiaoying.) | Luo, Yi (Luo, Yi.) | Guo, Xia (Guo, Xia.)

Indexed by:

EI Scopus SCIE

Abstract:

Highly sensitive photodetection is indispensable in applications, such as remote sensing, imaging, and smoke alarming. III-V nitrides are promising candidates for photodetectors due to their continuously tunable bandgap, radiation hardness, and temperature stability. However, the sensitivity of traditional III-V nitride-based photodetectors is limited by poor crystal quality which stems from lattice mismatch-induced point defects and dislocations. Recently, a new type of graphene-colloidal quantum dot (QD) hybrid phototransistor has been preferentially used to obtain high detection sensitivity, but III-V nitride-based colloidal QDs are hard to synthesize. Here, a highly sensitive QD/graphene hybrid photodetector is demonstrated by using self-assembled InGaN QDs. The photoconductance in the 2D graphene sheet is tuned by photogenerated carriers in the quantum dots when illuminated, and this effect leads to a current gain mechanism. The photodetector achieves an ultrahigh responsivity over 10(9) A W-1, a current gain of 10(9) and fW light detectivity even at room temperature. This study paves the way for new types of highly sensitive III-V nitride-based photodetectors despite the insufficient crystal quality.

Keyword:

InGaN quantum dots graphene ultrahigh sensitivity photodetectors

Author Community:

  • [ 1 ] [Hu, Anqi]Beijing Univ Posts & Telecommun, Beijing Key Lab Work Safety Intelligent Monitorin, State Key Lab Informat Photon & Opt Commun, Sch Elect Engn, Beijing 100876, Peoples R China
  • [ 2 ] [He, Xiaoying]Beijing Univ Posts & Telecommun, Beijing Key Lab Work Safety Intelligent Monitorin, State Key Lab Informat Photon & Opt Commun, Sch Elect Engn, Beijing 100876, Peoples R China
  • [ 3 ] [Guo, Xia]Beijing Univ Posts & Telecommun, Beijing Key Lab Work Safety Intelligent Monitorin, State Key Lab Informat Photon & Opt Commun, Sch Elect Engn, Beijing 100876, Peoples R China
  • [ 4 ] [Tian, Huijun]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 5 ] [Liu, Qiaoli]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 6 ] [Wang, Lei]Tsinghua Univ, Beijing Natl Res Ctr Informat Sci & Technol BNRis, Dept Elect Engn, Beijing 100084, Peoples R China
  • [ 7 ] [Wang, Lai]Tsinghua Univ, Beijing Natl Res Ctr Informat Sci & Technol BNRis, Dept Elect Engn, Beijing 100084, Peoples R China
  • [ 8 ] [Luo, Yi]Tsinghua Univ, Beijing Natl Res Ctr Informat Sci & Technol BNRis, Dept Elect Engn, Beijing 100084, Peoples R China

Reprint Author's Address:

  • 郭霞

    [Guo, Xia]Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Sch Elect Engn, Beijing Key Lab Work Safety Intelligent Monitorin, Beijing 100876, Peoples R China;;[Wang, Lei]Tsinghua Univ, Beijing Natl Res Ctr Informat Sci & Technol BNRis, Dept Elect Engn, Beijing 100084, Peoples R China

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Source :

ADVANCED OPTICAL MATERIALS

ISSN: 2195-1071

Year: 2019

Issue: 8

Volume: 7

9 . 0 0 0

JCR@2022

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:211

JCR Journal Grade:1

Cited Count:

WoS CC Cited Count: 42

SCOPUS Cited Count: 41

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 8

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