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Author:

Jin, D. (Jin, D..) | Wang, Z. (Wang, Z..) (Scholars:王湛) | Guo, Y. (Guo, Y..) | Zhang, W. (Zhang, W..) | Zhao, X. (Zhao, X..) | Wang, Q. (Wang, Q..) (Scholars:王群)

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Scopus

Abstract:

In order to weaken the lattice self-heating effect of strained-Si HBT with vertical substrate, a trapezoid Ge doping profile in base is proposed and the device model is established with SILVACO TCAD. It is shown that temperature coefficient of the device is decreased, which is benefit for high power application, at the expense of the decrease of the current gain. Therefore, a further design of superjunction collector structure is presented to enhance the breakdown voltage which is irrelevant to the current gain. As a result, the product of current gain-breakdown voltage in the novel strained-Si HBT with vertical substrate is 1.61 times higher that the conventional device, which develops the high power application of SiGe HBTs. © 2015 IEEE.

Keyword:

Ge doping profile; HBT; Strain-Si; Superjunction collector

Author Community:

  • [ 1 ] [Jin, D.]Institute of Laser Engineering, Beijing University of Technology, Beijing, 100124, China
  • [ 2 ] [Jin, D.]College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing, 100124, China
  • [ 3 ] [Wang, Z.]Institute of Laser Engineering, Beijing University of Technology, Beijing, 100124, China
  • [ 4 ] [Guo, Y.]College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing, 100124, China
  • [ 5 ] [Zhang, W.]College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing, 100124, China
  • [ 6 ] [Zhao, X.]College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing, 100124, China
  • [ 7 ] [Wang, Q.]Institute of Laser Engineering, Beijing University of Technology, Beijing, 100124, China

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Source :

International Conference on Communication Technology Proceedings, ICCT

Year: 2016

Volume: 2016-February

Page: 357-360

Language: English

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 1

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 4

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