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Author:

Kong, L. (Kong, L..) | Deng, J. (Deng, J..) | Chen, L. (Chen, L..)

Indexed by:

Scopus SCIE

Abstract:

ZnS is an important wide band gap semiconductor with extensive potential applications. ZnS thin films were deposited on quartz glass substrates by radio frequency (RF) magnetron sputtering, and then were annealed at 200 degrees C, 350 degrees C and 500 degrees C temperatures in a vacuum atmosphere and a sulfur atmosphere respectively. Effects of the different annealing atmosphere on structure, optical constants, Raman properties and band gap of the ZnS films were investigated. XRD data shows cubic structure for all the films with (111) as the highly preferential orientation, and shows that sulfur atmosphere is better to crystalline quality than vacuum. EDS analysis shows that the sulfur atmosphere can elevate S atomic percentage. Optical constants were obtained using ellipsometry analysis. Raman spectra also supports that the sulfur atmosphere is helpful to crystalline quality. The transmission spectra were measured and the band gap of 3.16 - 3.39eV was obtained using Tauc formula and extrapolation method. The band gap of the films annealed in S atmosphere has a blue shift compared with that annealed in vacuum at every same annealing temperature. It is demonstrated that ZnS films possessing good structural and optical properties can be obtained by the RF magnetron sputtering and the sulfur atmosphere annealing route.

Keyword:

Annealing Sulfur atmosphere Vacuum atmosphere RF magnetron sputtering ZnS thin films

Author Community:

  • [ 1 ] [Kong, L.]Beijing Univ Technol, Coll Appl Sci, Beijing 100124, Peoples R China
  • [ 2 ] [Deng, J.]Beijing Univ Technol, Coll Appl Sci, Beijing 100124, Peoples R China
  • [ 3 ] [Chen, L.]Beijing Univ Technol, Coll Appl Sci, Beijing 100124, Peoples R China

Reprint Author's Address:

  • [Deng, J.]Beijing Univ Technol, Coll Appl Sci, Beijing 100124, Peoples R China

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Source :

CHALCOGENIDE LETTERS

ISSN: 1584-8663

Year: 2017

Issue: 3

Volume: 14

Page: 87-96

1 . 0 0 0

JCR@2022

ESI Discipline: PHYSICS;

ESI HC Threshold:158

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count: 10

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 12

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