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Author:

Yang, Q. (Yang, Q..) | Ji, L. (Ji, L..) (Scholars:嵇灵) | Xu, B. (Xu, B..) | Yan, T. (Yan, T..) | Wang, W. (Wang, W..) (Scholars:王伟) | Lin, Z. (Lin, Z..)

Indexed by:

Scopus PKU CSCD

Abstract:

Large-scale periodic dot matrix anti-reflective microstructures were fabricated on the surface by using UV picosecond laser with rapid line scanning to improve the infrared transmittance of As2Se3 glass. In the study, the laser ablation threshold of As2Se3 glass was concluded and the optimal line scanning method was designed. The transmittance of the fabricated chalcogenide glass increased about 10.0 % and 5.2% in wavelength ranged from 11.0 μm~12.4 μm and 13.0 μm~14.2 μm, respectively. In addition, the wettability of the glass was not damaged by laser scanning. The processing was carried out in air condition showing low cost, high controllability and high efficiency. It only took 3.65 s to finish the fabrication of 8 mm×8 mm surface structures. Both the size and space of the surface microstructure unit can be controlled according to the application requirement. The removal of the chalcogenide glass induced by laser was mainly based on "cold fabrication" in which no obvious thermal effects inducing the element change on the surface were observed. Higher laser energy could induce obvious thermal effect resulting in melting of the ablation points and bump of the crater edges. © 2017, Editorial Office of Opto-Electronic Engineering. All right reserved.

Keyword:

Antireflection; As2Se3 chalcogenide glass; Contact angle; Picosecond laser; Surface micro-structure

Author Community:

  • [ 1 ] [Yang, Q.]Institute of Laser Engineering, Beijing University of Technology, Beijing, 100124, China
  • [ 2 ] [Ji, L.]Institute of Laser Engineering, Beijing University of Technology, Beijing, 100124, China
  • [ 3 ] [Xu, B.]China Building Materials Academy, Beijing, 100024, China
  • [ 4 ] [Yan, T.]Institute of Laser Engineering, Beijing University of Technology, Beijing, 100124, China
  • [ 5 ] [Wang, W.]Institute of Laser Engineering, Beijing University of Technology, Beijing, 100124, China
  • [ 6 ] [Lin, Z.]Institute of Laser Engineering, Beijing University of Technology, Beijing, 100124, China

Reprint Author's Address:

  • 嵇灵

    [Ji, L.]Institute of Laser Engineering, Beijing University of TechnologyChina

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Source :

Opto-Electronic Engineering

ISSN: 1003-501X

Year: 2017

Issue: 12

Volume: 44

Page: 1200-1209

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 4

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 5

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