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Author:

胡莉婷 (胡莉婷.) | 季凌飞 (季凌飞.) | 吴燕 (吴燕.) | 林真源 (林真源.)

Indexed by:

EI Scopus PKU CSCD

Abstract:

通过激光辐照固态Al膜,制备了一种p型重掺杂4H-SiC,分析了Al膜厚度、激光脉冲个数对掺杂结果的影响,验证了不同工艺参数对p型掺杂层表面电学性能的调控作用.结果表明,当Al膜厚度为120 nm,脉冲个数为50时,掺杂试样的最大载流子浓度为6.613×1017 cm-3,最小体电阻率为17.36Ω·cm,掺杂浓度(粒子数浓度)可达6.6×1019 cm-3.4H-SiC的Al掺杂改性机理为:在紫外激光作用下,Si-C键断裂,Al原子替代Si原子形成p型掺杂层.

Keyword:

准分子激光 半绝缘4H-SiC 薄膜 Al掺杂

Author Community:

  • [ 1 ] [胡莉婷]北京工业大学
  • [ 2 ] [季凌飞]北京工业大学
  • [ 3 ] [吴燕]北京工业大学
  • [ 4 ] [林真源]北京工业大学

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Source :

中国激光

ISSN: 0258-7025

Year: 2018

Issue: 6

Volume: 45

Page: 98-105

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count: 2

Chinese Cited Count:

30 Days PV: 5

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