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Author:

Zhang, Wenli (Zhang, Wenli.) | Huang, Xiucheng (Huang, Xiucheng.) | Liu, Zhengyang (Liu, Zhengyang.) | Lee, Fred C. (Lee, Fred C..) | She, Shuojie (She, Shuojie.) | Du, Weijing (Du, Weijing.) | Li, Qiang (Li, Qiang.) (Scholars:李强)

Indexed by:

EI Scopus SCIE

Abstract:

Lateral gallium nitride (GaN)-based high-electron-mobility transistor (HEMT) power devices have high current density, high switching speed, and low on-resistance in comparison to the established silicon (Si)-based semiconductor devices. These superior characteristics make GaN HEMTs ideal for high-frequency, high-efficiency power conversion. Using efficient GaN HEMT devices switched at high frequency in power electronic systems could lead to an increase in power density as well as a reduction in the weight, size, and cost of the system. However, conventional packaging configurations often compromise the benefits provided by high-performance GaN HEMT devices, for example, by increasing the parasitic inductance and resistance in the current loops of the device. This undesirable package-induced performance degradation is prominent in the cascode GaN device, where the combination of a high-voltage depletion-mode GaN semiconductor and low-voltage enhancement-mode Si semiconductor is needed. In this study, a new package is introduced for high-voltage cascode GaN devices and is successfully demonstrated to make the device more suitable for megahertz operation. This packaging prototype for cascode GaN devices is fabricated in a power quad flat no-lead format with the new features of a stack-die structure, embedded external capacitor, and flip-chip configuration. The parasitic ringing in hard-switching turn-off and switching losses in soft-switching transitions are both effectively reduced for this newly packaged device compared with a traditional package using the same GaN and Si devices. Improved thermal dissipation capability is also realized using this new package for better reliability.

Keyword:

packaging Cascode structure gallium nitride (GaN) high-electron-mobility transistor (HEMT) high frequency stack-die structure

Author Community:

  • [ 1 ] [Zhang, Wenli]Virginia Polytech Inst & State Univ, Bradley Dept Elect & Comp Engn, Ctr Power Elect Syst, Blacksburg, VA 24061 USA
  • [ 2 ] [Huang, Xiucheng]Virginia Polytech Inst & State Univ, Bradley Dept Elect & Comp Engn, Ctr Power Elect Syst, Blacksburg, VA 24061 USA
  • [ 3 ] [Liu, Zhengyang]Virginia Polytech Inst & State Univ, Bradley Dept Elect & Comp Engn, Ctr Power Elect Syst, Blacksburg, VA 24061 USA
  • [ 4 ] [Lee, Fred C.]Virginia Polytech Inst & State Univ, Bradley Dept Elect & Comp Engn, Ctr Power Elect Syst, Blacksburg, VA 24061 USA
  • [ 5 ] [Du, Weijing]Virginia Polytech Inst & State Univ, Bradley Dept Elect & Comp Engn, Ctr Power Elect Syst, Blacksburg, VA 24061 USA
  • [ 6 ] [Li, Qiang]Virginia Polytech Inst & State Univ, Bradley Dept Elect & Comp Engn, Ctr Power Elect Syst, Blacksburg, VA 24061 USA
  • [ 7 ] [She, Shuojie]Beijing Univ Technol, Reliabil Phys Lab, Coll Elect Informat & Control Engn, Beijing 100124, Peoples R China

Reprint Author's Address:

  • [Zhang, Wenli]Virginia Polytech Inst & State Univ, Bradley Dept Elect & Comp Engn, Ctr Power Elect Syst, Blacksburg, VA 24061 USA

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Source :

IEEE TRANSACTIONS ON POWER ELECTRONICS

ISSN: 0885-8993

Year: 2016

Issue: 2

Volume: 31

Page: 1344-1353

6 . 7 0 0

JCR@2022

ESI Discipline: ENGINEERING;

ESI HC Threshold:166

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count: 51

SCOPUS Cited Count: 59

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 4

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