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Author:

Qiu, Hui-Bin (Qiu, Hui-Bin.) | Liu, Shi-Bing (Liu, Shi-Bing.) (Scholars:刘世炳)

Indexed by:

EI Scopus SCIE

Abstract:

Weibel instability in plasma, where the ion distribution is isotropic and the electron component of the plasma possesses the anisotropic temperature distribution, is investigated based on the kinetic theory in context of nonextensive statistics mechanics. The instability growth rate is shown to be dependent on the nonextensive parameters of both electron and ion, and in the extensive limit, the result in Maxwellian distribution plasma is recovered. The instability growth rate is found to be enhanced as the nonextensive parameter of electron increases. (C) 2013 AIP Publishing LLC.

Keyword:

Author Community:

  • [ 1 ] [Qiu, Hui-Bin]Beijing Univ Technol, Inst Laser Engn, Strong Field & Ultrafast Photon Lab, Beijing 100124, Peoples R China
  • [ 2 ] [Liu, Shi-Bing]Beijing Univ Technol, Inst Laser Engn, Strong Field & Ultrafast Photon Lab, Beijing 100124, Peoples R China

Reprint Author's Address:

  • [Qiu, Hui-Bin]Beijing Univ Technol, Inst Laser Engn, Strong Field & Ultrafast Photon Lab, Beijing 100124, Peoples R China

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Source :

PHYSICS OF PLASMAS

ISSN: 1070-664X

Year: 2013

Issue: 10

Volume: 20

2 . 2 0 0

JCR@2022

ESI Discipline: PHYSICS;

JCR Journal Grade:2

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count: 7

SCOPUS Cited Count: 7

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 3

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