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Author:

Liu, W. Q. (Liu, W. Q..) (Scholars:刘卫强) | Cui, Z. Z. (Cui, Z. Z..) | Yi, X. F. (Yi, X. F..) | Yue, M. (Yue, M..) (Scholars:岳明) | Jiang, Y. B. (Jiang, Y. B..) | Zhang, D. T. (Zhang, D. T..) (Scholars:张东涛) | Zhang, J. X. (Zhang, J. X..) | Liu, X. B. (Liu, X. B..)

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CPCI-S EI Scopus SCIE

Abstract:

Spark plasma sintering technique had been applied to prepare bulk isotropic and anisotropic nanostructured Nd-Fe-B permanent magnets via hot pressing and subsequent hot deformation process. Influences of processing conditions and deformation height reduction on the structure and magnetic properties of the magnets were investigated. For the hot deformed magnet with 80% height reduction, XRD patterns of the anisotropic magnets show dominant (00l) diffraction peaks indicating evident c-axis crystallographic alignment in the magnet. Under the optimal processing conditions, the anisotropic magnet with 80% height reduction exhibits excellent magnetic properties as remanence (B(r)) of 1.492 T, coercive force (H(ci)) of 1004 kA/m, and the maximum energy product [(BH)(max)] of 400 kJ/m(3), which are among the highest reported magnetic properties of nanostructured Nd-Fe-B permanent magnets. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3339067]

Keyword:

Author Community:

  • [ 1 ] [Liu, W. Q.]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 2 ] [Cui, Z. Z.]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 3 ] [Yue, M.]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 4 ] [Jiang, Y. B.]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 5 ] [Zhang, D. T.]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 6 ] [Zhang, J. X.]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 7 ] [Liu, X. B.]McGill Univ, Dept Phys, Montreal, PQ H3A 2T8, Canada
  • [ 8 ] [Liu, X. B.]McGill Univ, Ctr Phys Mat, Montreal, PQ H3A 2T8, Canada

Reprint Author's Address:

  • 岳明

    [Yue, M.]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China

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Source :

JOURNAL OF APPLIED PHYSICS

ISSN: 0021-8979

Year: 2010

Issue: 9

Volume: 107

3 . 2 0 0

JCR@2022

ESI Discipline: PHYSICS;

JCR Journal Grade:2

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count: 33

SCOPUS Cited Count: 36

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 5

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