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Author:

Jin Dongyue (Jin Dongyue.) | Zhang Wanrong (Zhang Wanrong.) | Xie Hongyun (Xie Hongyun.) | Chen Liang (Chen Liang.) | Shen Pei (Shen Pei.) | Hu Ning (Hu Ning.)

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EI Scopus SCIE

Abstract:

The two-dimensional temperature profile of a power SiGe HBT with traditional uniform emitter finger spacing is calculated, which shows that there is a higher temperature in the central region of the device. With the aid of the theoretical analysis, an optimized structure of the HBT with non-uniform emitter finger spacing is presented. The peak temperature is lowered by 23.82 K, and the thermal resistance is also improved by 15.09% compared with that of the uniform one. The improvements above are ascribed to the increasing the spacing between fingers, and hence suppressing the heat flow from adjacent fingers to the center finger. Based on the analytical results, two types of HBTs with uniform emitter finger spacing and non-uniform emitter finger spacing are fabricated and their temperature profiles and thermal resistance are measured. The measured results agree well with the calculated results, verifying the accuracy of the calculations. For the HBT with non-uniform emitter finger spacing, the peak temperature and the thermal resistance are improved markedly over a wide biasing range compared with that of the uniform one. Therefore, both the calculated results and the experimental results verify that the optimized structure of power HBT with non-uniform emitter finger spacing is superior to the uniform emitter spacing structure for enhancing the thermal stability of power devices over a wide biasing range. (C) 2009 Elsevier Ltd. All rights reserved.

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Author Community:

  • [ 1 ] [Jin Dongyue]Beijing Univ Technol, Coll Elect Informat & Control Engn, Beijing 100124, Peoples R China
  • [ 2 ] [Zhang Wanrong]Beijing Univ Technol, Coll Elect Informat & Control Engn, Beijing 100124, Peoples R China
  • [ 3 ] [Xie Hongyun]Beijing Univ Technol, Coll Elect Informat & Control Engn, Beijing 100124, Peoples R China
  • [ 4 ] [Chen Liang]Beijing Univ Technol, Coll Elect Informat & Control Engn, Beijing 100124, Peoples R China
  • [ 5 ] [Shen Pei]Beijing Univ Technol, Coll Elect Informat & Control Engn, Beijing 100124, Peoples R China
  • [ 6 ] [Hu Ning]Beijing Univ Technol, Coll Elect Informat & Control Engn, Beijing 100124, Peoples R China

Reprint Author's Address:

  • [Jin Dongyue]Beijing Univ Technol, Coll Elect Informat & Control Engn, Beijing 100124, Peoples R China

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Source :

MICROELECTRONICS RELIABILITY

ISSN: 0026-2714

Year: 2009

Issue: 4

Volume: 49

Page: 382-386

1 . 6 0 0

JCR@2022

ESI Discipline: ENGINEERING;

JCR Journal Grade:2

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count: 5

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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