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采用二维面探测器X射线衍射(XRD)测量1μm和0.5μm厚Al互连线退火前后的残余应力.沉积态Al线均为拉应力,且随膜厚的增加而减小.沿长度方向的应力明显高于宽度方向的应力,表面法线方向应力最小.250℃退火2.5h后,互连线在各方向上的应力都减弱,其中1μm Al线应力减弱幅度高于0.5μm互连线.采用电子背散射衍射(EBSD)方法,测量退火前后Al互连线(111),(100),(110)取向晶粒的IQ值.退火后平均IQ值提高,互连线残余内应力随之减小.EBSD分析结果与XRD应力测试结果相符合.
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Source :
半导体学报
ISSN: 0253-4177
Year: 2006
Issue: z1
Volume: 27
Page: 403-406
Cited Count:
WoS CC Cited Count: 0
SCOPUS Cited Count:
ESI Highly Cited Papers on the List: 0 Unfold All
WanFang Cited Count: 5
Chinese Cited Count:
30 Days PV: 11
Affiliated Colleges: