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Author:

杨胶溪 (杨胶溪.) | 吕反修 (吕反修.) | 毛卫民 (毛卫民.) | 左铁钏 (左铁钏.)

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CQVIP PKU CSCD

Abstract:

利用直流电弧等离子体喷射化学气相沉积在Mo基体上制备了不同织构的金刚石厚膜.用扫描电境(SEM)观察金刚石膜的形貌,用XRD表征晶体取向,用极图和取向分布函数法计算金刚石膜的不同织构,利用三点弯曲法测量金刚石膜的断裂强度.结果表明,金刚石膜的断裂强度随着衍射峰强度比值I(111)/I(220)的增大而不断降低.{110}织构的金刚石膜具有最高的断裂强度.

Keyword:

金刚石膜 织构 断裂强度 自支撑

Author Community:

  • [ 1 ] [杨胶溪]北京工业大学
  • [ 2 ] [吕反修]北京科技大学
  • [ 3 ] [毛卫民]北京科技大学
  • [ 4 ] [左铁钏]北京工业大学

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Source :

金属热处理

ISSN: 0254-6051

Year: 2005

Issue: 6

Volume: 30

Page: 2-5

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count: 4

Chinese Cited Count:

30 Days PV: 11

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