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Author:

Ji, Y (Ji, Y.) | Guo, HS (Guo, HS.) | Xu, XD (Xu, XD.) | Shi, JX (Shi, JX.) | Zhong, TX (Zhong, TX.)

Indexed by:

EI Scopus SCIE

Abstract:

A scanning electron microscope (SEM), in an oxygen environment, was set-up to study the charging phenomena and charge compensation of oxides. Under an O-2 pressure between 2.9 x 10(-3) and 2 x 10(-2) Pa, the charging of an amorphous SiO2 with Cu stripes and a polycrystalline Al2O3 were reduced. The charging effect and charge compensation of oxides may be due to the formation of surface anion vacancies under primary electron bombardment and the replenishment of oxygen ions under an oxygen atmosphere. The Auger electron spectroscopy (AES) of Al2O3 proved that the charging effect of the Al2O3 was completely compensated in the environment of O-2 at pressures down to 5 x 10(-6) Pa.

Keyword:

charging effect oxygen environment SEM oxides

Author Community:

  • [ 1 ] Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100022, Peoples R China

Reprint Author's Address:

  • [Ji, Y]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100022, Peoples R China

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Source :

INSTRUMENTATION SCIENCE & TECHNOLOGY

ISSN: 1073-9149

Year: 2004

Issue: 1

Volume: 32

Page: 61-68

1 . 6 0 0

JCR@2022

ESI Discipline: ENGINEERING;

JCR Journal Grade:3

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 1

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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