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Author:

汪旭洋 (汪旭洋.) | 邓金祥 (邓金祥.) (Scholars:邓金祥) | 赵卫平 (赵卫平.) | 杨冰 (杨冰.) | 郭清秀 (郭清秀.) | 杨萍 (杨萍.)

Abstract:

介绍了用电子束蒸发法制备c-BN薄膜,通过FTIR分析得出制备的薄膜是富硼氮化硼薄膜。选定样品进行退火处理,退火温度为800℃,退火时间为1h,得到薄膜中的立方相在经过退火处理后有所增加。同时对样品XPS研究发现,在没有退火前的样品是富硼氮化硼,在退火后薄膜样品中的氮硼比也迅速升高。XPS的研究和FTIR的研究得到的结果基本吻合。

Keyword:

FTIR XPS c-BN薄膜 退火 电子束蒸发法

Author Community:

  • [ 1 ] 北京工业大学应用数理学院

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Year: 2009

Language: Chinese

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 11

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