Abstract:
<正>a-Si:H薄膜在太阳能电池、薄膜晶体管、大面积平面显示和传感器等光电器件上有广阔的应用前景.近来,为了获得高质量、高沉积速率的a-Si:H薄膜,MW ECR CVD在国际上越来越受到人们重视.与其它几种传统的CVD技术相比,MW ECR CVD具有以下特点:运行气压低,ECR等离子体的工作气压一般在10~(-2)~IPa;能量转化率高,95%以上的微波能量
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Year: 2001
Language: Chinese
Cited Count:
WoS CC Cited Count: 0
SCOPUS Cited Count:
ESI Highly Cited Papers on the List: 0 Unfold All
WanFang Cited Count:
Chinese Cited Count:
30 Days PV: 12
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