Direct　writing　of　plasmonic　nanostructures　is　demonstrated　by　nanoscale-tensile-stress　induced　patterning　through　interference　crosslinking　in　a　polymer　film　and　by　single-pulse　interference　ablation　of　a　gold　film.　Nanoscale-tensile-stress　from　the　interference　crosslinking　of　polymer　films　which　are　exposed　to　the　interference　pattern　of　UV　laser　beams　stretches　evaporated　gold　films　and　induces　pattern　transfer　from　polymer　into　gold　nanostructures.　Instead,　plasmonic　nanostructures　can　be　directly　patterned　by　the　interference　ablation.　Being　exposed　to　the　interference　pattern　of　an　UV　laser　pulse,　the　gold　is　directly　removed　within　the　bright　interference　fringes,　producing　periodically　arranged　plasmonic　nanostructures.