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Author:

Guo, Qixun (Guo, Qixun.) | Wu, Yu (Wu, Yu.) | Wang, Dongwei (Wang, Dongwei.) | Han, Gang (Han, Gang.) | Wang, Xuemin (Wang, Xuemin.) | Fu, Libo (Fu, Libo.) | Wang, Lihua (Wang, Lihua.) (Scholars:王立华) | He, Wei (He, Wei.) | Zhu, Tao (Zhu, Tao.) | Zhu, Zhendong (Zhu, Zhendong.) | Liu, Tao (Liu, Tao.) | Yu, Guanghua (Yu, Guanghua.) | Teng, Jiao (Teng, Jiao.)

Indexed by:

EI Scopus SCIE

Abstract:

Negative magnetoresistance (MR) is not only of great fundamental interest for condensed matter physics and materials science, but also important for practical applications, especially magnetic data storage and sensors. However, the microscopic origin of negative MR is still elusive and the nature of the negative MR in magnetic topological insulators has still not been completely elucidated. Here, we report magnetotransport studies on Cr doped (Bi1-xSbx)(2)Te-3 topological insulator thin films grown by magnetron sputtering. At the temperature of 2 K, a giant negative MR reaching 61% is observed at H = 2 T. We show that the negative MR is closely related to the position of the Fermi level, and it reaches the maximum when the Fermi level is gated near the charge neutral point. We attribute these results to the Coulomb potential due to the random composition fluctuations in Cr doped (Bi1-xSbx)(2)Te-3. Our results provide a deeper insight into the mechanism of negative MR, and are helpful to realize the quantum anomalous Hall effect in the sputtered Cr-(Bi1-xSbx)(2)Te-3 thin-film systems by tuning the Fermi level and reducing disorder effects.

Keyword:

Author Community:

  • [ 1 ] [Guo, Qixun]Univ Sci & Technol Beijing, Dept Mat Phys & Chem, Beijing 100083, Peoples R China
  • [ 2 ] [Wu, Yu]Univ Sci & Technol Beijing, Dept Mat Phys & Chem, Beijing 100083, Peoples R China
  • [ 3 ] [Yu, Guanghua]Univ Sci & Technol Beijing, Dept Mat Phys & Chem, Beijing 100083, Peoples R China
  • [ 4 ] [Teng, Jiao]Univ Sci & Technol Beijing, Dept Mat Phys & Chem, Beijing 100083, Peoples R China
  • [ 5 ] [Wu, Yu]Beijing Tongfang Huachuang Technol Co Ltd, Beijing 100089, Peoples R China
  • [ 6 ] [Wang, Dongwei]Natl Ctr Nanosci & Technol, CAS Key Lab Standardizat & Measurement Nanotechno, Beijing 100190, Peoples R China
  • [ 7 ] [Han, Gang]Univ Sci & Technol Beijing, Collaborat Innovat Ctr Adv Steel Technol, Beijing 100083, Peoples R China
  • [ 8 ] [Wang, Xuemin]Univ Sci & Technol Beijing, Collaborat Innovat Ctr Adv Steel Technol, Beijing 100083, Peoples R China
  • [ 9 ] [Fu, Libo]Beijing Univ Technol, Beijing Key Lab Microstruct & Property Adv Mat, Inst Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
  • [ 10 ] [Wang, Lihua]Beijing Univ Technol, Beijing Key Lab Microstruct & Property Adv Mat, Inst Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
  • [ 11 ] [He, Wei]Chinese Acad Sci, Beijing Natl Lab Condensed Matter Phys, Beijing 100190, Peoples R China
  • [ 12 ] [Zhu, Tao]Chinese Acad Sci, Beijing Natl Lab Condensed Matter Phys, Beijing 100190, Peoples R China
  • [ 13 ] [He, Wei]Chinese Acad Sci, Inst Phys, Beijing 100190, Peoples R China
  • [ 14 ] [Zhu, Tao]Chinese Acad Sci, Inst Phys, Beijing 100190, Peoples R China
  • [ 15 ] [Zhu, Zhendong]Natl Inst Metrol, Beijing 100029, Peoples R China
  • [ 16 ] [Liu, Tao]Univ Elect Sci & Technol China, Natl Engn Res Ctr Electromagnet Radiat Control Ma, Chengdu 610054, Peoples R China

Reprint Author's Address:

  • [Teng, Jiao]Univ Sci & Technol Beijing, Dept Mat Phys & Chem, Beijing 100083, Peoples R China

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Source :

RSC ADVANCES

Year: 2021

Issue: 23

Volume: 11

Page: 13964-13969

3 . 9 0 0

JCR@2022

ESI Discipline: CHEMISTRY;

ESI HC Threshold:96

JCR Journal Grade:2

Cited Count:

WoS CC Cited Count: 2

SCOPUS Cited Count: 2

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 13

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