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Author:

Li, Xuhong (Li, Xuhong.) | Chen, Xiaoqing (Chen, Xiaoqing.) | Li, Songyu (Li, Songyu.) | Chu, Feihong (Chu, Feihong.) | Deng, Wenjie (Deng, Wenjie.) | Zhang, Xiaobo (Zhang, Xiaobo.) | Li, Jingjie (Li, Jingjie.) | Bao, Xiulong (Bao, Xiulong.) | An, Boxing (An, Boxing.) | You, Congya (You, Congya.) | Liu, Famin (Liu, Famin.) | Zhang, Yongzhe (Zhang, Yongzhe.) (Scholars:张永哲)

Indexed by:

EI Scopus SCIE

Abstract:

Two-dimensional (2D) materials have been demonstrated to be promising candidates to design high performance photodetectors owing to their strong light-matter interaction. However, the performance of 2D material photodetectors is still unsatisfactory, such as slow response speed due to defects and vulnerable contact interface, which impede their rapid development in the field of optoelectronics. In this paper, we obtained the ideal and large photosensitive van der Waals Schottky interface by the laminating-flipping method. Hence, a fast response speed (<1 ms) and high detectivity (>10(12) Jones) are observed on the van der Waals Schottky junction photodiode. More importantly, benefiting from the flat Schottky interface (the roughness similar to 0.6 nm), a sub-bandgap light response modulated by the Schottky barrier height (cut-off edge at 1050 nm) has been detected based on the large Au/MoSe2 sensitive Schottky interface internal photoemission. As a result, a universal strategy for the sub-bandgap near-infrared van der Waals Schottky junction detector of 2D materials was obtained.

Keyword:

Author Community:

  • [ 1 ] [Li, Xuhong]Beihang Univ, Sch Phys, Beijing 100191, Peoples R China
  • [ 2 ] [Li, Songyu]Beihang Univ, Sch Phys, Beijing 100191, Peoples R China
  • [ 3 ] [Liu, Famin]Beihang Univ, Sch Phys, Beijing 100191, Peoples R China
  • [ 4 ] [Li, Xuhong]Beijing Univ Technol, Fac Informat Technol, Key Lab Optoelect Technol, Minist Educ, Beijing 100124, Peoples R China
  • [ 5 ] [Chen, Xiaoqing]Beijing Univ Technol, Fac Informat Technol, Key Lab Optoelect Technol, Minist Educ, Beijing 100124, Peoples R China
  • [ 6 ] [Zhang, Yongzhe]Beijing Univ Technol, Fac Informat Technol, Key Lab Optoelect Technol, Minist Educ, Beijing 100124, Peoples R China
  • [ 7 ] [Chu, Feihong]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China
  • [ 8 ] [Deng, Wenjie]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China
  • [ 9 ] [Zhang, Xiaobo]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China
  • [ 10 ] [Li, Jingjie]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China
  • [ 11 ] [An, Boxing]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China
  • [ 12 ] [You, Congya]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China
  • [ 13 ] [Bao, Xiulong]Univ Coll Dublin, Beijing Dublin Int Coll BDIC, Sch Elect & Elect Engn, Dublin, Ireland

Reprint Author's Address:

  • 张永哲

    [Liu, Famin]Beihang Univ, Sch Phys, Beijing 100191, Peoples R China;;[Chen, Xiaoqing]Beijing Univ Technol, Fac Informat Technol, Key Lab Optoelect Technol, Minist Educ, Beijing 100124, Peoples R China;;[Zhang, Yongzhe]Beijing Univ Technol, Fac Informat Technol, Key Lab Optoelect Technol, Minist Educ, Beijing 100124, Peoples R China

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Source :

NANOSCALE

ISSN: 2040-3364

Year: 2021

Issue: 39

Volume: 13

Page: 16448-16456

6 . 7 0 0

JCR@2022

ESI Discipline: PHYSICS;

ESI HC Threshold:72

JCR Journal Grade:1

Cited Count:

WoS CC Cited Count: 14

SCOPUS Cited Count: 15

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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