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Author:

Pang, Yan (Pang, Yan.) | Lu, Yao (Lu, Yao.) | Wang, Xiang (Wang, Xiang.) | Zhou, Qiang (Zhou, Qiang.) | Ren, Yanlin (Ren, Yanlin.) | Liu, Zhaomiao (Liu, Zhaomiao.) (Scholars:刘赵淼)

Indexed by:

EI Scopus SCIE

Abstract:

Under pressure-driven conditions of gas, the bubble size was experimentally studied in different types of T-junction microchannels having widths of 300 mu m and heights of 100 mu m. The bubble length increases with the flow rate, and we observed that it also increased with the driving pressure. This was proved through the published formulas for the bubble flow pressure difference using the experimental results. Three types of downstream channels-normal, movable, and deformed walls (of different lengths)-were used to study emerging bubbles, and a nonlinear relationship was observed between them. The channel type directly influenced the bubble size by affecting the resistance of the channel with bubbles. Furthermore, the difference between the resistances of a normal channel and a deformed channel with the same typical dimension was determined using a comparator structure between two parallel channels to evaluate the effect of flow resistance on bubble generation. The adjustment of the flow rate at downstream will give feedback to the bubble generation in the double T-junction channel. (C) 2021 Elsevier Ltd. All rights reserved.

Keyword:

Bubble size Bubble formation T-junction Flow resistance

Author Community:

  • [ 1 ] [Pang, Yan]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China
  • [ 2 ] [Lu, Yao]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China
  • [ 3 ] [Wang, Xiang]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China
  • [ 4 ] [Zhou, Qiang]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China
  • [ 5 ] [Ren, Yanlin]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China
  • [ 6 ] [Liu, Zhaomiao]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China
  • [ 7 ] [Pang, Yan]Beijing Univ Technol, Beijing Key Lab Adv Mfg Technol, Beijing 100124, Peoples R China
  • [ 8 ] [Wang, Xiang]Beijing Univ Technol, Beijing Key Lab Adv Mfg Technol, Beijing 100124, Peoples R China
  • [ 9 ] [Liu, Zhaomiao]Beijing Univ Technol, Beijing Key Lab Adv Mfg Technol, Beijing 100124, Peoples R China

Reprint Author's Address:

  • 刘赵淼

    [Liu, Zhaomiao]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China

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Source :

CHEMICAL ENGINEERING SCIENCE

ISSN: 0009-2509

Year: 2021

Volume: 246

4 . 7 0 0

JCR@2022

ESI Discipline: CHEMISTRY;

ESI HC Threshold:96

JCR Journal Grade:2

Cited Count:

WoS CC Cited Count: 13

SCOPUS Cited Count: 13

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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