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Author:

Li, Songyu (Li, Songyu.) | Chen, Xiaoqing (Chen, Xiaoqing.) | Zhang, Zeyu (Zhang, Zeyu.) | Li, Xuhong (Li, Xuhong.) | Deng, Wenjie (Deng, Wenjie.) | Liu, Famin (Liu, Famin.) | Lu, Yue (Lu, Yue.) (Scholars:卢岳) | Zhang, Yongzhe (Zhang, Yongzhe.) (Scholars:张永哲)

Indexed by:

EI Scopus SCIE

Abstract:

2D-layered transition metal dichalcogenides (TMDCs) have attracted tremendous interest as candidate material for next-generation nanoelectronics because of their atomically layered lattices. However, their charge modulation based on chemical doping is commonly inefficient owing to the ultrathin crystal structures, which therefore limits their applications in electronic devices. Here, a photoinduced electrostatic modulation of WSe2 field-effect transistor with charge-trapping layers of hexagonal-BN (h-BN)/SiO2 is achieved for both n- and p-type polarities, which demonstrates a large on/off ratio exceeding 10(6). This electrostatic modulation of WSe2 performs a reversible and high carrier regulation from an electron density of 3 x 10(12) cm(-2) to a hole density of 1.5 x 10(12) cm(-2). Through this facile and powerful approach, a p-n homojunction rectifier and a complementary metal-oxide-semiconductor inverter are successfully prepared and perform the functions of AC-DC conversion and cascadable logic NOT. Consequently, these results provide a huge potential for wide applications of TMDC-based logic electronics.

Keyword:

photoinduced electrostatic modulation WSe complementary metal-oxide-semiconductor (CMOS) inverter p-n homojunction rectifier (2)

Author Community:

  • [ 1 ] [Li, Songyu]Beihang Univ, Sch Phys, Beijing 100191, Peoples R China
  • [ 2 ] [Li, Xuhong]Beihang Univ, Sch Phys, Beijing 100191, Peoples R China
  • [ 3 ] [Liu, Famin]Beihang Univ, Sch Phys, Beijing 100191, Peoples R China
  • [ 4 ] [Chen, Xiaoqing]Beijing Univ Technol, Fac Informat Technol, Key Lab Optoelect Technol, Educ Minist China, Beijing 100124, Peoples R China
  • [ 5 ] [Deng, Wenjie]Beijing Univ Technol, Fac Informat Technol, Key Lab Optoelect Technol, Educ Minist China, Beijing 100124, Peoples R China
  • [ 6 ] [Zhang, Yongzhe]Beijing Univ Technol, Fac Informat Technol, Key Lab Optoelect Technol, Educ Minist China, Beijing 100124, Peoples R China
  • [ 7 ] [Zhang, Zeyu]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
  • [ 8 ] [Lu, Yue]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing 100124, Peoples R China

Reprint Author's Address:

  • 张永哲

    [Chen, Xiaoqing]Beijing Univ Technol, Fac Informat Technol, Key Lab Optoelect Technol, Educ Minist China, Beijing 100124, Peoples R China;;[Zhang, Yongzhe]Beijing Univ Technol, Fac Informat Technol, Key Lab Optoelect Technol, Educ Minist China, Beijing 100124, Peoples R China

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Source :

ADVANCED ELECTRONIC MATERIALS

ISSN: 2199-160X

Year: 2021

Issue: 1

Volume: 8

6 . 2 0 0

JCR@2022

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:116

JCR Journal Grade:1

Cited Count:

WoS CC Cited Count: 4

SCOPUS Cited Count: 5

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 6

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