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Author:

Zhao, Lingyu (Zhao, Lingyu.) | Zhao, Huiying (Zhao, Huiying.) | Wang, Hairong (Wang, Hairong.) | Zhang, Mingjie (Zhang, Mingjie.) | Xie, Ruiqing (Xie, Ruiqing.) | Zhang, Mingzhuang (Zhang, Mingzhuang.)

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EI Scopus SCIE

Abstract:

Planar polishing is an important manufacturing process for high-precision planar components. In this study, a real-time dresser and a planar polishing process based on real-time dressing for large-aperture optical plane components were developed. Efficient dressing of a polishing pad surface can be achieved with the real-time dresser. Compared with the conventional method, real-time correction for the surface shape of the polishing pad was realized via the temperature parameter t in the real-time dresser, and this parameter can be optimized through optimization experiments. Finally, a series of experiments was carried out to verify the effectiveness of the real-time dresser on surface dressing. Through the real-time dressing of the polishing pad surface, the flatness peak-valley deviation and the root-mean-square deviation of the flat optical element surface (430 x 430 mm) can reach 3 lambda and 0.9 lambda, which is improved by 25% and 33%, respectively. (C) 2022 Optica Publishing Group

Keyword:

Author Community:

  • [ 1 ] [Zhao, Lingyu]Xi An Jiao Tong Univ, State Key Lab Mfg Syst Engn, Xian 710049, Shaanxi, Peoples R China
  • [ 2 ] [Zhao, Huiying]Xi An Jiao Tong Univ, State Key Lab Mfg Syst Engn, Xian 710049, Shaanxi, Peoples R China
  • [ 3 ] [Wang, Hairong]Xi An Jiao Tong Univ, State Key Lab Mfg Syst Engn, Xian 710049, Shaanxi, Peoples R China
  • [ 4 ] [Xie, Ruiqing]Xi An Jiao Tong Univ, State Key Lab Mfg Syst Engn, Xian 710049, Shaanxi, Peoples R China
  • [ 5 ] [Zhang, Mingjie]Beijing Univ Technol, Off Sci & Technol Dev, Beijing 100124, Peoples R China
  • [ 6 ] [Xie, Ruiqing]China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Sichuan, Peoples R China
  • [ 7 ] [Zhang, Mingzhuang]China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Sichuan, Peoples R China

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Source :

APPLIED OPTICS

ISSN: 1559-128X

Year: 2022

Issue: 12

Volume: 61

Page: 3319-3327

1 . 9

JCR@2022

1 . 9 0 0

JCR@2022

ESI Discipline: PHYSICS;

ESI HC Threshold:41

JCR Journal Grade:3

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 1

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 14

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