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Author:

Ma, Haixin (Ma, Haixin.) | Xing, Yanhui (Xing, Yanhui.) | Han, Jun (Han, Jun.) | Cui, Boyao (Cui, Boyao.) | Lei, Ting (Lei, Ting.) | Tu, Huayao (Tu, Huayao.) | Guan, Baolu (Guan, Baolu.) | Zeng, Zhongming (Zeng, Zhongming.) | Zhang, Baoshun (Zhang, Baoshun.) | Lv, Weiming (Lv, Weiming.)

Indexed by:

EI Scopus SCIE

Abstract:

Photogating effect based on vertical structure of 2D materials allows for the realization of a highly sensitive photodetector. A highly sensitive and broad-spectrum (365-965 nm) photodetector is reported based on the indium selenide (InSe)/rhenium disulfide (ReS2) vertical heterostructure, where the top layer InSe serves as the photogate to regulate the channel current, enabling a large photoconductive gain of 10(6). The detectivity of the photodetector can reach 6.51 x 10(13) Jones, making this one of the highest values among reported transition metal dichalcogenide photodetectors. The photodetector represents a high responsivity of 1921 A W-1, an ultrahigh external quantum efficiency (EQE) of 6.53 x 10(5)%, and a fast response time of 21.6 ms. The outstanding properties of the InSe/ReS2 heterojunction reveal the promising potential in high-efficient, ultrasensitive, broadband photodetectors.

Keyword:

indium selenide van-der-Waals heterojunction photogating broad-spectrum detection rhenium disulfide

Author Community:

  • [ 1 ] [Ma, Haixin]Beijing Univ Technol, Coll Microelect, Minist Educ, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 2 ] [Xing, Yanhui]Beijing Univ Technol, Coll Microelect, Minist Educ, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 3 ] [Han, Jun]Beijing Univ Technol, Coll Microelect, Minist Educ, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 4 ] [Cui, Boyao]Beijing Univ Technol, Coll Microelect, Minist Educ, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 5 ] [Guan, Baolu]Beijing Univ Technol, Coll Microelect, Minist Educ, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 6 ] [Ma, Haixin]Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion, Key Lab Nanodevices & Applicat, Suzhou 215123, Jiangsu, Peoples R China
  • [ 7 ] [Lei, Ting]Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion, Key Lab Nanodevices & Applicat, Suzhou 215123, Jiangsu, Peoples R China
  • [ 8 ] [Tu, Huayao]Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion, Key Lab Nanodevices & Applicat, Suzhou 215123, Jiangsu, Peoples R China
  • [ 9 ] [Zeng, Zhongming]Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion, Key Lab Nanodevices & Applicat, Suzhou 215123, Jiangsu, Peoples R China
  • [ 10 ] [Zhang, Baoshun]Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion, Key Lab Nanodevices & Applicat, Suzhou 215123, Jiangsu, Peoples R China
  • [ 11 ] [Lv, Weiming]Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion, Key Lab Nanodevices & Applicat, Suzhou 215123, Jiangsu, Peoples R China
  • [ 12 ] [Zeng, Zhongming]Chinese Acad Sci, Suzhou Inst NanoTech & Nanobion, Nanchang Nanodevices & Technol Div, Nanchang 330200, Jiangxi, Peoples R China
  • [ 13 ] [Lv, Weiming]Chinese Acad Sci, Suzhou Inst NanoTech & Nanobion, Nanchang Nanodevices & Technol Div, Nanchang 330200, Jiangxi, Peoples R China

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Source :

ADVANCED OPTICAL MATERIALS

ISSN: 2195-1071

Year: 2021

Issue: 5

Volume: 10

9 . 0 0 0

JCR@2022

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:116

JCR Journal Grade:1

Cited Count:

WoS CC Cited Count: 39

SCOPUS Cited Count: 47

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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