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Abstract:
Semiconductor-based photocatalysis is an ideal method for air purification by eliminating nitrogen oxide (NO). However, sluggish carrier separation, photocatalysts deactivation and incomplete oxidation are significant bottlenecks for photocatalytic treatment of indoor pollutant NO. Herein, ZnO with assorted structures is fabricated and undergoes further modification for deliberate surface defect constructions. Utilized flux agents during the synthesis provide a more feasible reducing atmosphere, under which spontaneous generations of the surface vacancies become easier, and gradient concentrations are precisely controlled. Photocatalyst characterizations affirm the successful creation of surface defects, which are further evaluated by solar-light-driven NO (ppb level) removal investigations. Results showed that ZnO rich in oxygen vacancies (VO-rich ZnO) exhibited 5.43 and 1.63 times enhanced NO removal with fewer toxic product NO2formations than its counterparts pristine and VO-poor ZnO, respectively. Importantly, with higher VOon the unusual nonpolar facets, VO-rich ZnO does not only display enhanced NO conversion, but also shows the unselective NO removal process by producing NO3-. The plausible reaction mechanisms of promoted NO conversions are further investigated based on the surface VO, well-positioned band structures, and enhanced carrier separations. Results showed that the surface VOwith gradient concentrations are not only promoted carrier separation, but also facilitate molecular oxygen activation, leading to the generations of strong oxidant superoxide radicals (·O2-), and contributing to the enhanced improved efficiency. Adsorption of small molecules (O2, H2O and NO) on the defective surface was further investigated by density functional theory (DFT) calculations, which validated the successful adsorption/activation of NO and O2, further contributed to the improved NO conversions. © 2022 American Chemical Society. All rights reserved.
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ACS Catalysis
Year: 2022
Issue: 16
Volume: 12
Page: 10004-10017
1 2 . 9
JCR@2022
1 2 . 9 0 0
JCR@2022
ESI Discipline: CHEMISTRY;
ESI HC Threshold:53
JCR Journal Grade:1
CAS Journal Grade:1
Cited Count:
SCOPUS Cited Count: 108
ESI Highly Cited Papers on the List: 0 Unfold All
WanFang Cited Count:
Chinese Cited Count:
30 Days PV: 13
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