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Author:

Zhu, Yan-Xu (Zhu, Yan-Xu.) | Li, Lai-Long (Li, Lai-Long.) | Bai, Xin-He (Bai, Xin-He.) | Song, Hui-Hui (Song, Hui-Hui.) | Shi, Dong (Shi, Dong.) | Yang, Zhuang (Yang, Zhuang.) | Yang, Zhong (Yang, Zhong.)

Indexed by:

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Abstract:

Ferroelectric materials have been very active in recent years as the infrared devices of photosensitive films. Their good piezoelectricity, ferroelectric, pyroelectric, photoelectric and nonlinear optical properties, and the integration of semiconductor technology, have a broad application prospect in the field of microelectronics and optoelectronic technology. The experiment combined the ferroelectric material lead zirconate titanate as the photosensitive layer and the GaN base high electron mobility transistor (HEMT). The photosensitive gate GaN based HEMT device was successfully prepared and detected under the light wavelength of 365 nm. After a large number of experimental tests, the light illumination of the device was found in this band. The saturation current reaches 28 mA, and the saturation current is increased by 12 mA compared with that without illumination. In addition, by reasonably changing the size of the device structure, including the gate length and the gate leakage distance, it is found that the saturation output current decreases in turn with the increase of the gate length, while the effect of the gap between the gate leakage distance on the threshold voltage and the saturation current is not significant. It can be seen that changing the device structure parameters can improve the performance of the device and the detection efficiency. © 2019, Science Press. All right reserved.

Keyword:

Transistors Microelectronics Nonlinear optics Photovoltaic effects Wide band gap semiconductors III-V semiconductors Semiconductor device manufacture Lead zirconate titanate Photosensitivity Ferroelectricity Light sensitive materials Threshold voltage Ferroelectric films Electron mobility High electron mobility transistors Gallium nitride Crystallography

Author Community:

  • [ 1 ] [Zhu, Yan-Xu]Key Laboratory of Opto-electronic Technology, Ministry of Education, Beijing University of Technology, Beijing; 100124, China
  • [ 2 ] [Li, Lai-Long]Key Laboratory of Opto-electronic Technology, Ministry of Education, Beijing University of Technology, Beijing; 100124, China
  • [ 3 ] [Bai, Xin-He]Huizhou Branch, China Mobile Group Guangdong Co., Ltd., Huizhou; 516000, China
  • [ 4 ] [Song, Hui-Hui]Key Laboratory of Opto-electronic Technology, Ministry of Education, Beijing University of Technology, Beijing; 100124, China
  • [ 5 ] [Shi, Dong]Key Laboratory of Opto-electronic Technology, Ministry of Education, Beijing University of Technology, Beijing; 100124, China
  • [ 6 ] [Yang, Zhuang]Key Laboratory of Opto-electronic Technology, Ministry of Education, Beijing University of Technology, Beijing; 100124, China
  • [ 7 ] [Yang, Zhong]Key Laboratory of Opto-electronic Technology, Ministry of Education, Beijing University of Technology, Beijing; 100124, China

Reprint Author's Address:

  • [li, lai-long]key laboratory of opto-electronic technology, ministry of education, beijing university of technology, beijing; 100124, china

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Source :

Chinese Journal of Luminescence

ISSN: 1000-7032

Year: 2019

Issue: 3

Volume: 40

Page: 311-316

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 7

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