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Author:

Jiang, Nai (Jiang, Nai.) | Shi, Jia (Shi, Jia.) | Wu, Heng (Wu, Heng.) | Zhang, Dong (Zhang, Dong.) | Zhu, Hui (Zhu, Hui.) | Liu, Xinfeng (Liu, Xinfeng.) | Tan, Ping-Heng (Tan, Ping-Heng.) | Chang, Kai (Chang, Kai.) | Zheng, Houzhi (Zheng, Houzhi.) | Shen, Chao (Shen, Chao.)

Indexed by:

EI Scopus SCIE

Abstract:

Layered transition metal dichalcogenides (TMDs) are a promising platform for new photonic and optoelectronic devices. Exciton-phonon interaction is critical in determining their characteristics such as the exciton coherence lifetime and linewidth. However, the exciton linewidth obtained by conventional reflection spectrum is greatly affected by the background signals, and the research into exciton-phonon coupling difference induced by stacking-order in multi-layer structures is still lacking. In this work, the temperature-dependent exciton linewidths of CVD-grown large-area monolayer, 2H and 3R-stacking bilayer WS2 based on a self-designed reflective magnetic circular dichroism (MCD) spectrum are systematically investigated. It is found that 2H-bilayer WS2 exhibits significantly larger exciton linewidth compared with monolayer and 3R bilayer, which can be attributed to the appearance of new phonon-assisted relaxation channels caused by interlayer coupling. Meanwhile, 3R bilayer with a redshifted exciton peak has a narrower linewidth than 2H phase because the interlayer hopping is suppressed, resulting in the absence of interlayer scattering channel. These results provide intuitive evidence for the exciton linewidth-broadening and exciton-phonon coupling in different stacked layers and open up new vistas for the development of TMD-based narrow-linewidth nano-sensors devices.

Keyword:

exciton-phonon interaction stacking-order CVD-grown magnetic circular dichroism interlayer hopping

Author Community:

  • [ 1 ] [Jiang, Nai]Chinese Acad Sci, Inst Semicond, State Key Lab Superlatt & Microstruct, Beijing 100083, Peoples R China
  • [ 2 ] [Wu, Heng]Chinese Acad Sci, Inst Semicond, State Key Lab Superlatt & Microstruct, Beijing 100083, Peoples R China
  • [ 3 ] [Zhang, Dong]Chinese Acad Sci, Inst Semicond, State Key Lab Superlatt & Microstruct, Beijing 100083, Peoples R China
  • [ 4 ] [Zhu, Hui]Chinese Acad Sci, Inst Semicond, State Key Lab Superlatt & Microstruct, Beijing 100083, Peoples R China
  • [ 5 ] [Tan, Ping-Heng]Chinese Acad Sci, Inst Semicond, State Key Lab Superlatt & Microstruct, Beijing 100083, Peoples R China
  • [ 6 ] [Chang, Kai]Chinese Acad Sci, Inst Semicond, State Key Lab Superlatt & Microstruct, Beijing 100083, Peoples R China
  • [ 7 ] [Zheng, Houzhi]Chinese Acad Sci, Inst Semicond, State Key Lab Superlatt & Microstruct, Beijing 100083, Peoples R China
  • [ 8 ] [Shen, Chao]Chinese Acad Sci, Inst Semicond, State Key Lab Superlatt & Microstruct, Beijing 100083, Peoples R China
  • [ 9 ] [Jiang, Nai]Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
  • [ 10 ] [Wu, Heng]Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
  • [ 11 ] [Zhang, Dong]Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
  • [ 12 ] [Tan, Ping-Heng]Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
  • [ 13 ] [Chang, Kai]Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
  • [ 14 ] [Zheng, Houzhi]Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
  • [ 15 ] [Shen, Chao]Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
  • [ 16 ] [Shi, Jia]Beijing Univ Technol, Inst Informat Photon Technol, Fac Sci, Beijing 100124, Peoples R China
  • [ 17 ] [Shi, Jia]Beijing Univ Technol, Fac Sci, Sch Phys & Optoelect, Beijing 100124, Peoples R China
  • [ 18 ] [Liu, Xinfeng]Natl Ctr Nanosci & Technol, CAS Ctr Excellence Nanosci, CAS Key Lab Standardizat & Measurement Nanotechnol, Beijing 100190, Peoples R China

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Source :

ADVANCED OPTICAL MATERIALS

ISSN: 2195-1071

Year: 2023

9 . 0 0 0

JCR@2022

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:26

Cited Count:

WoS CC Cited Count: 3

SCOPUS Cited Count: 1

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 6

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Online/Total:1107/10572888
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